Microphase Separation of Block Copolymer Thin Films

• Published in: Macromolecular rapid communications. Vol. 31; no. 7; pp. 591 - 608
• Main Authors: Zhang, Jilin, Yu, Xinhong, Yang, Ping, Peng, Juan, Luo, Chunxia, Huang, Weihuan, Han, Yanchun
• Format: Journal Article
• Language: English
• Published: Weinheim WILEY-VCH Verlag 06.04.2010; WILEY‐VCH Verlag; Wiley
• Subjects: Applied sciences; Arrays; Block copolymers; Exact sciences and technology; lithography; microphase separation; Nanocomposites; nanoheterogeneity; Nanomaterials; Nanostructure; Organic polymers; Photolithography; Physicochemistry of polymers; Properties and characterization; Separation; Structure, morphology and analysis; Thin films; block copolymers; State of the art; Patterning; microphase separation; Lithography; Order disorder transformation; Block copolymer; nanoheterogeneity; Thin film

Today, high‐ordered micro‐ and nano‐patterned surfaces are widely used in many areas, such as in the preparation of super‐thin dielectric films, photonic crystals, antireflective films, super‐non‐wetting surfaces, bio‐compatible surfaces and microelectric devices. Considering the critical fabricatio...