Microphase Separation of Block Copolymer Thin Films
Today, high‐ordered micro‐ and nano‐patterned surfaces are widely used in many areas, such as in the preparation of super‐thin dielectric films, photonic crystals, antireflective films, super‐non‐wetting surfaces, bio‐compatible surfaces and microelectric devices. Considering the critical fabricatio...
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| Published in | Macromolecular rapid communications. Vol. 31; no. 7; pp. 591 - 608 |
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| Main Authors | , , , , , , |
| Format | Journal Article |
| Language | English |
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Weinheim
WILEY-VCH Verlag
06.04.2010
WILEY‐VCH Verlag Wiley |
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| Online Access | Get full text |
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| Abstract | Today, high‐ordered micro‐ and nano‐patterned surfaces are widely used in many areas, such as in the preparation of super‐thin dielectric films, photonic crystals, antireflective films, super‐non‐wetting surfaces, bio‐compatible surfaces and microelectric devices. Considering the critical fabrication conditions and the irreducible high cost of the photolithography technique in patterning nano‐scale structures (<100 nm), the development of other micro‐ and nano‐patterning techniques that can be used to fabricate long‐range ordered features – especially nanoscale arrays – is a promising subject in surface science. In contrast to the traditional photolithography patterning technique, block copolymers can spontaneously phase separate into arrays of periodic patterns with length‐scales of 10–50 nm, which provides an efficient pathway to pattern nanoscale features. Today, preparing long‐range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays, not only being a simple process but also having a lower cost than traditional methods. In this feature article, we first summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Then, evolution, order–order transitions and reversible switching microdomains are considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. Finally, the outlook of this research area will be given.
Preparing long‐range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays. We summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Evolution, order–order transitions and reversible switching microdomains are also considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. The outlook for this research area is discussed. |
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| AbstractList | Today, high‐ordered micro‐ and nano‐patterned surfaces are widely used in many areas, such as in the preparation of super‐thin dielectric films, photonic crystals, antireflective films, super‐non‐wetting surfaces, bio‐compatible surfaces and microelectric devices. Considering the critical fabrication conditions and the irreducible high cost of the photolithography technique in patterning nano‐scale structures (<100 nm), the development of other micro‐ and nano‐patterning techniques that can be used to fabricate long‐range ordered features – especially nanoscale arrays – is a promising subject in surface science. In contrast to the traditional photolithography patterning technique, block copolymers can spontaneously phase separate into arrays of periodic patterns with length‐scales of 10–50 nm, which provides an efficient pathway to pattern nanoscale features. Today, preparing long‐range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays, not only being a simple process but also having a lower cost than traditional methods. In this feature article, we first summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Then, evolution, order–order transitions and reversible switching microdomains are considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. Finally, the outlook of this research area will be given.
magnified image Today, high-ordered micro- and nano-patterned surfaces are widely used in many areas, such as in the preparation of super-thin dielectric films, photonic crystals, antireflective films, super-non-wetting surfaces, bio-compatible surfaces and microelectric devices. Considering the critical fabrication conditions and the irreducible high cost of the photolithography technique in patterning nano-scale structures (<100 nm), the development of other micro- and nano-patterning techniques that can be used to fabricate long-range ordered features - especially nanoscale arrays - is a promising subject in surface science. In contrast to the traditional photolithography patterning technique, block copolymers can spontaneously phase separate into arrays of periodic patterns with length-scales of 10-50 nm, which provides an efficient pathway to pattern nanoscale features. Today, preparing long-range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays, not only being a simple process but also having a lower cost than traditional methods. In this feature article, we first summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Then, evolution, order-order transitions and reversible switching microdomains are considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. Finally, the outlook of this research area will be given. Today, high-ordered micro- and nano-patterned surfaces are widely used in many areas, such as in the preparation of super-thin dielectric films, photonic crystals, antireflective films, super-non-wetting surfaces, bio-compatible surfaces and microelectric devices. Considering the critical fabrication conditions and the irreducible high cost of the photolithography technique in patterning nano-scale structures (<100 nm), the development of other micro- and nano-patterning techniques that can be used to fabricate long-range ordered features - especially nanoscale arrays - is a promising subject in surface science. In contrast to the traditional photolithography patterning technique, block copolymers can spontaneously phase separate into arrays of periodic patterns with length-scales of 10-50 nm, which provides an efficient pathway to pattern nanoscale features. Today, preparing long-range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays, not only being a simple process but also having a lower cost than traditional methods. In this feature article, we first summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Then, evolution, order-order transitions and reversible switching microdomains are considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. Finally, the outlook of this research area will be given.Today, high-ordered micro- and nano-patterned surfaces are widely used in many areas, such as in the preparation of super-thin dielectric films, photonic crystals, antireflective films, super-non-wetting surfaces, bio-compatible surfaces and microelectric devices. Considering the critical fabrication conditions and the irreducible high cost of the photolithography technique in patterning nano-scale structures (<100 nm), the development of other micro- and nano-patterning techniques that can be used to fabricate long-range ordered features - especially nanoscale arrays - is a promising subject in surface science. In contrast to the traditional photolithography patterning technique, block copolymers can spontaneously phase separate into arrays of periodic patterns with length-scales of 10-50 nm, which provides an efficient pathway to pattern nanoscale features. Today, preparing long-range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays, not only being a simple process but also having a lower cost than traditional methods. In this feature article, we first summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Then, evolution, order-order transitions and reversible switching microdomains are considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. Finally, the outlook of this research area will be given. Today, high‐ordered micro‐ and nano‐patterned surfaces are widely used in many areas, such as in the preparation of super‐thin dielectric films, photonic crystals, antireflective films, super‐non‐wetting surfaces, bio‐compatible surfaces and microelectric devices. Considering the critical fabrication conditions and the irreducible high cost of the photolithography technique in patterning nano‐scale structures (<100 nm), the development of other micro‐ and nano‐patterning techniques that can be used to fabricate long‐range ordered features – especially nanoscale arrays – is a promising subject in surface science. In contrast to the traditional photolithography patterning technique, block copolymers can spontaneously phase separate into arrays of periodic patterns with length‐scales of 10–50 nm, which provides an efficient pathway to pattern nanoscale features. Today, preparing long‐range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays, not only being a simple process but also having a lower cost than traditional methods. In this feature article, we first summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Then, evolution, order–order transitions and reversible switching microdomains are considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. Finally, the outlook of this research area will be given. Preparing long‐range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays. We summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Evolution, order–order transitions and reversible switching microdomains are also considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. The outlook for this research area is discussed. |
| Author | Zhang, Jilin Yang, Ping Yu, Xinhong Huang, Weihuan Luo, Chunxia Han, Yanchun Peng, Juan |
| Author_xml | – sequence: 1 givenname: Jilin surname: Zhang fullname: Zhang, Jilin organization: State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences; Graduate University of the Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, P. R. China – sequence: 2 givenname: Xinhong surname: Yu fullname: Yu, Xinhong organization: State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences; Graduate University of the Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, P. R. China – sequence: 3 givenname: Ping surname: Yang fullname: Yang, Ping organization: State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences; Graduate University of the Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, P. R. China – sequence: 4 givenname: Juan surname: Peng fullname: Peng, Juan organization: The Key Laboratory of Molecular Engineering of Polymers, Ministry of Education, Department of Macromolecular Science, Fudan University, Shanghai 200433, China – sequence: 5 givenname: Chunxia surname: Luo fullname: Luo, Chunxia organization: State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences; Graduate University of the Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, P. R. China – sequence: 6 givenname: Weihuan surname: Huang fullname: Huang, Weihuan organization: State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences; Graduate University of the Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, P. R. China – sequence: 7 givenname: Yanchun surname: Han fullname: Han, Yanchun email: ychan@ciac.jl.cn organization: State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences; Graduate University of the Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, P. R. China |
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| Copyright | Copyright © 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim 2015 INIST-CNRS Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. |
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| Keywords | block copolymers State of the art Patterning microphase separation Lithography Order disorder transformation Block copolymer nanoheterogeneity Thin film |
| Language | English |
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| Snippet | Today, high‐ordered micro‐ and nano‐patterned surfaces are widely used in many areas, such as in the preparation of super‐thin dielectric films, photonic... Today, high-ordered micro- and nano-patterned surfaces are widely used in many areas, such as in the preparation of super-thin dielectric films, photonic... |
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| SubjectTerms | Applied sciences Arrays Block copolymers Exact sciences and technology lithography microphase separation Nanocomposites nanoheterogeneity Nanomaterials Nanostructure Organic polymers Photolithography Physicochemistry of polymers Properties and characterization Separation Structure, morphology and analysis Thin films |
| Title | Microphase Separation of Block Copolymer Thin Films |
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