Disilane Cleavage with Selected Alkali and Alkaline Earth Metal Salts

The industry‐scale production of methylchloromonosilanes in the Müller–Rochow Direct Process is accompanied by the formation of a residue, the direct process residue (DPR), comprised of disilanes MenSi2Cl6‐n (n=1–6). Great research efforts have been devoted to the recycling of these disilanes into m...

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Published inChemistry : a European journal Vol. 25; no. 57; pp. 13202 - 13207
Main Authors Santowski, Tobias, Sturm, Alexander G., Lewis, Kenrick M., Felder, Thorsten, Holthausen, Max C., Auner, Norbert
Format Journal Article
LanguageEnglish
Published Germany Wiley Subscription Services, Inc 11.10.2019
John Wiley and Sons Inc
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Summary:The industry‐scale production of methylchloromonosilanes in the Müller–Rochow Direct Process is accompanied by the formation of a residue, the direct process residue (DPR), comprised of disilanes MenSi2Cl6‐n (n=1–6). Great research efforts have been devoted to the recycling of these disilanes into monosilanes to allow reintroduction into the siloxane production chain. In this work, disilane cleavage by using alkali and alkaline earth metal salts is reported. The reaction with metal hydrides, in particular lithium hydride (LiH), leads to efficient reduction of chlorine containing disilanes but also induces disproportionation into mono‐ and oligosilanes. Alkali and alkaline earth chlorides, formed in the course of the reduction, specifically induce disproportionation of highly chlorinated disilanes, whereas highly methylated disilanes (n>3) remain unreacted. Nearly quantitative DPR conversion into monosilanes was achieved by using concentrated HCl/ether solutions in the presence of lithium chloride. Too valuable for disposal or incineration: Simple recycling of the Müller–Rochow Direct Process residue with LiH yields monosilanes suitable for the reintroduction into the silicone production chain.
Bibliography:Dedicated to Professor Bernhard Rieger on the occasion of his 60th birthday
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ISSN:0947-6539
1521-3765
DOI:10.1002/chem.201902722