On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures - Efremov, Alexander; Lee, Byung Jun; Kwon, Kwang-Ho (Materials, 2021)
Keywords: Energy; Film thickness; Fluxes; Gas mixtures; Gases; Mixing ratio; Oxidation; Parameters; Perfluorocarbons; Plasma chemistry; Plasma diagnostics; Plasma etching; Plasmas (physics); Polymer films; Polymerization; Polymers; Reaction kinetics; Reactive ion etching; Review; Silicon dioxide; Silicon nitride; Thin films; Transistors; polymerization; effective reaction probability; etching kinetics; ion-assisted chemical reaction; fluorocarbon gas plasma; etching yield; active species; etching mechanism; plasma parameters