APA (7th ed.) Citation

Efremov, A., Lee, B. J., & Kwon, K. (2021). On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures. Materials, 14(6), 1432. https://doi.org/10.3390/ma14061432

Chicago Style (17th ed.) Citation

Efremov, Alexander, Byung Jun Lee, and Kwang-Ho Kwon. "On Relationships Between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures." Materials 14, no. 6 (2021): 1432. https://doi.org/10.3390/ma14061432.

MLA (9th ed.) Citation

Efremov, Alexander, et al. "On Relationships Between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures." Materials, vol. 14, no. 6, 2021, p. 1432, https://doi.org/10.3390/ma14061432.