Silicon as a ubiquitous contaminant in graphene derivatives with significant impact on device performance

Silicon-based impurities are ubiquitous in natural graphite. However, their role as a contaminant in exfoliated graphene and their influence on devices have been overlooked. Herein atomic resolution microscopy is used to highlight the existence of silicon-based contamination on various solution-proc...

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Published inNature communications Vol. 9; no. 1; pp. 5070 - 13
Main Authors Jalili, Rouhollah, Esrafilzadeh, Dorna, Aboutalebi, Seyed Hamed, Sabri, Ylias M, Kandjani, Ahmad E, Bhargava, Suresh K, Della Gaspera, Enrico, Gengenbach, Thomas R, Walker, Ashley, Chao, Yunfeng, Wang, Caiyun, Alimadadi, Hossein, Mitchell, David R G, Officer, David L, MacFarlane, Douglas R, Wallace, Gordon G
Format Journal Article
LanguageEnglish
Published England Nature Publishing Group 29.11.2018
Nature Publishing Group UK
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Abstract Silicon-based impurities are ubiquitous in natural graphite. However, their role as a contaminant in exfoliated graphene and their influence on devices have been overlooked. Herein atomic resolution microscopy is used to highlight the existence of silicon-based contamination on various solution-processed graphene. We found these impurities are extremely persistent and thus utilising high purity graphite as a precursor is the only route to produce silicon-free graphene. These impurities are found to hamper the effective utilisation of graphene in whereby surface area is of paramount importance. When non-contaminated graphene is used to fabricate supercapacitor microelectrodes, a capacitance value closest to the predicted theoretical capacitance for graphene is obtained. We also demonstrate a versatile humidity sensor made from pure graphene oxide which achieves the highest sensitivity and the lowest limit of detection ever reported. Our findings constitute a vital milestone to achieve commercially viable and high performance graphene-based devices.
AbstractList Silicon-based impurities are ubiquitous in natural graphite. However, their role as a contaminant in exfoliated graphene and their influence on devices have been overlooked. Herein atomic resolution microscopy is used to highlight the existence of silicon-based contamination on various solution-processed graphene. We found these impurities are extremely persistent and thus utilising high purity graphite as a precursor is the only route to produce silicon-free graphene. These impurities are found to hamper the effective utilisation of graphene in whereby surface area is of paramount importance. When non-contaminated graphene is used to fabricate supercapacitor microelectrodes, a capacitance value closest to the predicted theoretical capacitance for graphene is obtained. We also demonstrate a versatile humidity sensor made from pure graphene oxide which achieves the highest sensitivity and the lowest limit of detection ever reported. Our findings constitute a vital milestone to achieve commercially viable and high performance graphene-based devices.
Abstract Silicon-based impurities are ubiquitous in natural graphite. However, their role as a contaminant in exfoliated graphene and their influence on devices have been overlooked. Herein atomic resolution microscopy is used to highlight the existence of silicon-based contamination on various solution-processed graphene. We found these impurities are extremely persistent and thus utilising high purity graphite as a precursor is the only route to produce silicon-free graphene. These impurities are found to hamper the effective utilisation of graphene in whereby surface area is of paramount importance. When non-contaminated graphene is used to fabricate supercapacitor microelectrodes, a capacitance value closest to the predicted theoretical capacitance for graphene is obtained. We also demonstrate a versatile humidity sensor made from pure graphene oxide which achieves the highest sensitivity and the lowest limit of detection ever reported. Our findings constitute a vital milestone to achieve commercially viable and high performance graphene-based devices.
Silicon-based impurities are ubiquitous in natural graphite. However, their role as a contaminant in exfoliated graphene and their influence on devices have been overlooked. Herein atomic resolution microscopy is used to highlight the existence of silicon-based contamination on various solution-processed graphene. We found these impurities are extremely persistent and thus utilising high purity graphite as a precursor is the only route to produce silicon-free graphene. These impurities are found to hamper the effective utilisation of graphene in whereby surface area is of paramount importance. When non-contaminated graphene is used to fabricate supercapacitor microelectrodes, a capacitance value closest to the predicted theoretical capacitance for graphene is obtained. We also demonstrate a versatile humidity sensor made from pure graphene oxide which achieves the highest sensitivity and the lowest limit of detection ever reported. Our findings constitute a vital milestone to achieve commercially viable and high performance graphene-based devices. Silicon-based contaminants are ubiquitous in natural graphite, and they are thus expected to be present in exfoliated graphene. Here, the authors show that such impurities play a non-negligible role in graphene-based devices, and use high-purity parent graphite to boost the performance of graphene sensors and supercapacitor microelectrodes.
Silicon-based contaminants are ubiquitous in natural graphite, and they are thus expected to be present in exfoliated graphene. Here, the authors show that such impurities play a non-negligible role in graphene-based devices, and use high-purity parent graphite to boost the performance of graphene sensors and supercapacitor microelectrodes.
Silicon-based impurities are ubiquitous in natural graphite. However, their role as a contaminant in exfoliated graphene and their influence on devices have been overlooked. Herein atomic resolution microscopy is used to highlight the existence of silicon-based contamination on various solution-processed graphene. We found these impurities are extremely persistent and thus utilising high purity graphite as a precursor is the only route to produce silicon-free graphene. These impurities are found to hamper the effective utilisation of graphene in whereby surface area is of paramount importance. When non-contaminated graphene is used to fabricate supercapacitor microelectrodes, a capacitance value closest to the predicted theoretical capacitance for graphene is obtained. We also demonstrate a versatile humidity sensor made from pure graphene oxide which achieves the highest sensitivity and the lowest limit of detection ever reported. Our findings constitute a vital milestone to achieve commercially viable and high performance graphene-based devices.
ArticleNumber 5070
Author Aboutalebi, Seyed Hamed
Gengenbach, Thomas R
Officer, David L
Wang, Caiyun
Wallace, Gordon G
Sabri, Ylias M
Chao, Yunfeng
Della Gaspera, Enrico
Alimadadi, Hossein
Esrafilzadeh, Dorna
Jalili, Rouhollah
Kandjani, Ahmad E
Walker, Ashley
MacFarlane, Douglas R
Bhargava, Suresh K
Mitchell, David R G
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  orcidid: 0000-0003-1915-1151
  surname: Walker
  fullname: Walker, Ashley
  organization: Intelligent Polymer Research Institute & ARC Centre of Excellence for Electromaterials Science, Australian Institute for Innovative Materials, University of Wollongong, Wollongong, NSW, 2522, Australia
– sequence: 10
  givenname: Yunfeng
  surname: Chao
  fullname: Chao, Yunfeng
  organization: Intelligent Polymer Research Institute & ARC Centre of Excellence for Electromaterials Science, Australian Institute for Innovative Materials, University of Wollongong, Wollongong, NSW, 2522, Australia
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  givenname: Caiyun
  surname: Wang
  fullname: Wang, Caiyun
  organization: Intelligent Polymer Research Institute & ARC Centre of Excellence for Electromaterials Science, Australian Institute for Innovative Materials, University of Wollongong, Wollongong, NSW, 2522, Australia
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  surname: Wallace
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  organization: Intelligent Polymer Research Institute & ARC Centre of Excellence for Electromaterials Science, Australian Institute for Innovative Materials, University of Wollongong, Wollongong, NSW, 2522, Australia
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Snippet Silicon-based impurities are ubiquitous in natural graphite. However, their role as a contaminant in exfoliated graphene and their influence on devices have...
Abstract Silicon-based impurities are ubiquitous in natural graphite. However, their role as a contaminant in exfoliated graphene and their influence on...
Silicon-based impurities are ubiquitous in natural graphite. However, their role as a contaminant in exfoliated graphene and their influence on devices have...
Silicon-based contaminants are ubiquitous in natural graphite, and they are thus expected to be present in exfoliated graphene. Here, the authors show that...
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StartPage 5070
SubjectTerms Capacitance
Contaminants
Contamination
Graphene
Graphite
Impurities
Microelectrodes
Microscopy
Silicon
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Title Silicon as a ubiquitous contaminant in graphene derivatives with significant impact on device performance
URI https://www.ncbi.nlm.nih.gov/pubmed/30498194
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