A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings
In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impingin...
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| Published in | Materials Vol. 13; no. 5; p. 1038 |
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| Main Authors | , , , , , , |
| Format | Journal Article |
| Language | English |
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| Abstract | In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at −100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10−6 mm3 N−1m−1. |
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| AbstractList | In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at −100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10
−6
mm
3
N
−1
m
−1
. In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at -100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10-6 mm3 N-1m-1.In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at -100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10-6 mm3 N-1m-1. In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at -100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from similar to 40% surface defects coverage to similar to 1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 x 10(-6) mm(3) N(-1)m(-1). In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at -100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10 mm N m . In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at −100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10−6 mm3 N−1m−1. |
| Author | Kiss, Adrian Emil Sobetkii, Arcadie Kubart, Tomas Vitelaru, Catalin Constantin, Lidia Ruxandra Vladescu, Alina Parau, Anca Constantina |
| AuthorAffiliation | 4 Department of Electrical Engineering, The Ångström Laboratory, Uppsala University, P.O. Box 534, SE-751 21 Uppsala, Sweden; tomas.kubart@angstrom.uu.se 2 National Research Tomsk Polytechnic University, Lenin Avenue 43, 634050 Tomsk, Russia 1 National Institute of Research and Development for Optoelectronics—INOE 2000, 409 Atomistilor St., P.O. Box MG 05, 077125 Magurele-Bucharest, Romania; anca.parau@inoe.ro (A.C.P.); lidia.constantin@inoe.ro (L.R.C.); kadremil@yahoo.com (A.E.K.); alinava@inoe.ro (A.V.) 3 SC MGM STAR CONSTRUCT SRL, 7 Pancota St, 022773 Bucharest, Romania; sobetkii@yahoo.com |
| AuthorAffiliation_xml | – name: 1 National Institute of Research and Development for Optoelectronics—INOE 2000, 409 Atomistilor St., P.O. Box MG 05, 077125 Magurele-Bucharest, Romania; anca.parau@inoe.ro (A.C.P.); lidia.constantin@inoe.ro (L.R.C.); kadremil@yahoo.com (A.E.K.); alinava@inoe.ro (A.V.) – name: 2 National Research Tomsk Polytechnic University, Lenin Avenue 43, 634050 Tomsk, Russia – name: 4 Department of Electrical Engineering, The Ångström Laboratory, Uppsala University, P.O. Box 534, SE-751 21 Uppsala, Sweden; tomas.kubart@angstrom.uu.se – name: 3 SC MGM STAR CONSTRUCT SRL, 7 Pancota St, 022773 Bucharest, Romania; sobetkii@yahoo.com |
| Author_xml | – sequence: 1 givenname: Catalin orcidid: 0000-0002-8686-8577 surname: Vitelaru fullname: Vitelaru, Catalin – sequence: 2 givenname: Anca Constantina surname: Parau fullname: Parau, Anca Constantina – sequence: 3 givenname: Lidia Ruxandra surname: Constantin fullname: Constantin, Lidia Ruxandra – sequence: 4 givenname: Adrian Emil surname: Kiss fullname: Kiss, Adrian Emil – sequence: 5 givenname: Alina orcidid: 0000-0001-5770-4541 surname: Vladescu fullname: Vladescu, Alina – sequence: 6 givenname: Arcadie orcidid: 0000-0003-2556-5473 surname: Sobetkii fullname: Sobetkii, Arcadie – sequence: 7 givenname: Tomas orcidid: 0000-0003-2679-2387 surname: Kubart fullname: Kubart, Tomas |
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| Keywords | magnetron sputtering Ar+Ne+C2H2 gas mixture high power impulse magnetron sputtering (HiPIMS), process optimization carbon sputtering diamond like carbon (DLC), mechanical properties |
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| SubjectTerms | Ar+Ne+C2H2 gas mixture carbon sputtering diamond like carbon (DLC) high power impulse magnetron sputtering (HiPIMS) magnetron sputtering mechanical properties process optimization |
| Title | A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings |
| URI | https://www.ncbi.nlm.nih.gov/pubmed/32110856 https://www.proquest.com/docview/2369443576 https://pubmed.ncbi.nlm.nih.gov/PMC7084500 https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-410963 |
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