X-Ray diffraction and Raman spectroscopy for a better understanding of ZnO:Al growth process

• Published in: EPJ Photovoltaics Vol. 2; pp. 25002 - 25009
• Main Authors: Charpentier, C., Prod’homme, P., Maurin, I., Chaigneau, M., Roca i Cabarrocas, P.
• Format: Journal Article
• Language: English
• Published: Les Ulis EDP Sciences 01.01.2011
• Subjects: Adatoms; Aluminum oxide; Crystal structure; Crystallinity; Diffraction patterns; Electrical properties; Electromagnetism; Glass substrates; Hall effect; Magnetron sputtering; Microstructural analysis; Photovoltaic cells; Radio frequency; Raman spectra; Raman spectroscopy; Spectrum analysis; Structural damage; Thin films; X-ray diffraction; Zinc oxide; Zinc oxides

ZnO:Al thin films were prepared on glass substrates by radio frequency RF magnetron sputtering from a ceramic ZnO target mixed with Al2O3 (1 wt%) in pure argon atmosphere with a power of 250 W. Two series of samples were deposited, the first one as a function of the substrate temperature (between 20...