Manipulating the processing window of directed self-assembly in contact hole shrinking with binary block copolymer/homopolymer blending

• Published in: iScience Vol. 27; no. 4; p. 109425
• Main Authors: Wu, Zhiyong, Luo, Jiacheng, Li, Luyang, Dong, Qingshu, Zhang, Xiaohui, Li, Zili, Liu, Yadong, Ji, Shengxiang, Li, Weihua, Zhang, Yan, Xiong, Shisheng
• Format: Journal Article
• Language: English
• Published: United States Elsevier Inc 19.04.2024; Elsevier
• Subjects: Chemistry; Materials science; Physics; Materials science; Chemistry; Physics

Directed self-assembly (DSA) lithography has demonstrated significant potential in fabricating integrated circuits. However, DSA encounters limited processing windows due to the requirement for precise matching between the period of block copolymers (BCPs) and graphoepitaxy templates. We propose a b...