Nms‐Amides: An Amine Protecting Group with Unique Stability and Selectivity

• Published in: Chemistry : a European journal Vol. 29; no. 41; pp. e202301312 - n/a
• Main Authors: Spieß, Philipp, Sirvent, Ana, Tiefenbrunner, Irmgard, Sargueil, Jules, Fernandes, Anthony J., Arroyo‐Bondía, Ana, Meyrelles, Ricardo, Just, David, Prado‐Roller, Alexander, Shaaban, Saad, Kaiser, Daniel, Maulide, Nuno
• Format: Journal Article
• Language: English
• Published: WEINHEIM Wiley 20.07.2023; Wiley Subscription Services, Inc; John Wiley and Sons Inc
• Subjects: Amides; Amines; Chemistry; Chemistry, Multidisciplinary; density functional theory calculations; orthogonal deprotection; Physical Sciences; Protecting groups; Robustness; Science & Technology; Stability; Sulfonamides; protecting groups; CINACALCET; amines; density functional theory calculations; orthogonal deprotection; sulfonamides; BASIS-SETS; CLEAVAGE; STRATEGIES

p‐Toluenesulfonyl (Tosyl) and nitrobenzenesulfonyl (Nosyl) are two of the most common sulfonyl protecting groups for amines in contemporary organic synthesis. While p‐toluenesulfonamides are known for their high stability/robustness, their use in multistep synthesis is plagued by difficult removal....