Initial oxidation kinetics of Si(113)-(3 × 2) investigated using supersonic seeded molecular beams

• Published in: Surface Science Vol. 697; p. 121600
• Main Authors: Ohno, S., Tanaka, K., Kodama, H., Tanaka, M., Yoshigoe, A., Teraoka, Y.
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01.07.2020; Elsevier BV
• Subjects: Binding; Binding energy; Molecular beam; Molecular beams; Oxidation; Photoelectrons; Reaction kinetics; Real-time monitoring; Si surface; Silicon dioxide; Synchrotron radiation; Synchrotrons; XPS; Oxidation; XPS; Si surface; Molecular beam; Real-time monitoring

[Display omitted] The initial oxidation of silicon surfaces with (113) orientation has been investigated using high-resolution photoelectron spectroscopy with synchrotron radiation. In the present study, we investigated both the Si 2p state and the O 1s state to evaluate the oxide thickness and comp...