Nanofabrication by electron beam lithography and its applications: A review

• Published in: Microelectronic engineering Vol. 135; pp. 57 - 72
• Main Author: Chen, Yifang
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 05.03.2015
• Subjects: Electron beam lithography; High electron mobility transistors; Metamaterial; Metamaterials; Nanoelectronics; Nanofabrication; Nanophotonics; Nanostructure; Resists; Semiconductor devices; Single electrons; Tunneling; Nanophotonics; Nanofabrication; Nanostructure; Electron beam lithography; Metamaterial; Nanoelectronics

[Display omitted] •This review focus on EBL on single/multilayer resists for pattern transfer.•Applications in nanoelectronic devices, nanophotonic structures and nanostructures.•10 EBL resists are reviewed, including PMMA, UVIII, ZEP, UVN-30, HSQ, SU-8, etc.•Focused e-beam was also applied for the...