Direct optical lithography of functional inorganic nanomaterials

• Published in: Science (American Association for the Advancement of Science) Vol. 357; no. 6349; pp. 385 - 388
• Main Authors: Wang, Yuanyuan, Fedin, Igor, Zhang, Hao, Talapin, Dmitri V.
• Format: Journal Article
• Language: English
• Published: United States American Association for the Advancement of Science 28.07.2017; The American Association for the Advancement of Science
• Subjects: Carrier mobility; Crystals; Dielectric properties; Formulations; Impurities; Light; Lithography; Luminescence; Magnetic semiconductors; Manufacturing; Manufacturing industry; Metals; Nanocrystals; Nanomaterials; Nanotechnology; Optical properties; Oxides; Patterning; Photolithography; Photoresists; Polymers; Rare earth compounds; Solubility; Thin films; Ultraviolet radiation

Photolithography is an important manufacturing process that relies on using photoresists, typically polymer formulations, that change solubility when illuminated with ultraviolet light. Here, we introduce a general chemical approach for photoresist-free, direct optical lithography of functional inor...