RELATIONSHIP BETWEEN PATTERNING AND DISSOLUTION CHARACTARISTICS OF CHEMICAL AMPLIFICATION RESISTS USING PARTLY PROTECTED POLY(p-VINYLPHENOL)
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Published in | Journal of Photopolymer Science and Technology Vol. 4; no. 3; pp. 469 - 472 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Hiratsuka
The Society of Photopolymer Science and Technology(SPST)
1991
Japan Science and Technology Agency |
Online Access | Get full text |
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