Patterning of various silicon structures via polymer lithography and catalytic chemical etching

• Published in: Nanotechnology Vol. 22; no. 27; p. 275305
• Main Authors: Lee, Jung-Pil, Bang, Byoung Man, Choi, Sinho, Kim, Taesung, Park, Soojin
• Format: Journal Article
• Language: English
• Published: England IOP Publishing 08.07.2011
• ISSN: 0957-4484; 1361-6528
• DOI: 10.1088/0957-4484/22/27/275305

We demonstrate a facile fabrication of a rich variety of silicon patterns with different length scales by combining polymer lithography and a metal-assisted chemical etching method. Several types of polymer patterns were fabricated on silicon substrates, and silver layers were deposited on the patterned silicon surfaces and used to etch the silicon beneath. Various silicon patterns including topographic lines, concentric rings, and square arrays were created at a micro- and nanoscale after etching the silicon and subsequent removal of the patterned polymer masks. Alternatively, the arrays of sub-30 nm silicon nanowires were produced by a chemical etching of the silicon wafer which was covered with highly ordered polystyrene-block-polyvinylpyridine (PS-b-PVP) micellar films. In addition, silicon nanohole arrays were also generated by etching with hexagonally packed silver nanoparticles that were prepared using PS-b-PVP block copolymer templates.