Realization of ultrashallow junctions by plasma immersion ion implantation and laser annealing - Vervisch, V.; Etienne, H.; Torregrosa, F.; Roux, L.; Ottaviani, L.; Pasquinelli, M.; Sarnet, T.; Delaporte, P. (Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2008)
Keywords: Engineering Sciences; BF3 plasma; n-type silicon