APA (7th ed.) Citation

Vervisch, V., Etienne, H., Torregrosa, F., Roux, L., Ottaviani, L., Pasquinelli, M., . . . Delaporte, P. (2008). Realization of ultrashallow junctions by plasma immersion ion implantation and laser annealing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 26(1), 286-292. https://doi.org/10.1116/1.2834555

Chicago Style (17th ed.) Citation

Vervisch, V., H. Etienne, F. Torregrosa, L. Roux, L. Ottaviani, M. Pasquinelli, T. Sarnet, and P. Delaporte. "Realization of Ultrashallow Junctions by Plasma Immersion Ion Implantation and Laser Annealing." Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 26, no. 1 (2008): 286-292. https://doi.org/10.1116/1.2834555.

MLA (9th ed.) Citation

Vervisch, V., et al. "Realization of Ultrashallow Junctions by Plasma Immersion Ion Implantation and Laser Annealing." Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, vol. 26, no. 1, 2008, pp. 286-292, https://doi.org/10.1116/1.2834555.