Cui, J., Liu, X., Xie, Y., Wu, K., Wang, Y., Liu, Y., . . . Xia, Y. (2020). Improved electrochemical reversibility of Zn plating/stripping: A promising approach to suppress water-induced issues through the formation of H-bonding. Materials today energy, 18(C), 100563. https://doi.org/10.1016/j.mtener.2020.100563
Chicago Style (17th ed.) CitationCui, Jin, Xiaoyu Liu, Yihua Xie, Kai Wu, Yongqing Wang, Yuyu Liu, Jiujun Zhang, Jin Yi, and Yongyao Xia. "Improved Electrochemical Reversibility of Zn Plating/stripping: A Promising Approach to Suppress Water-induced Issues Through the Formation of H-bonding." Materials Today Energy 18, no. C (2020): 100563. https://doi.org/10.1016/j.mtener.2020.100563.
MLA (9th ed.) CitationCui, Jin, et al. "Improved Electrochemical Reversibility of Zn Plating/stripping: A Promising Approach to Suppress Water-induced Issues Through the Formation of H-bonding." Materials Today Energy, vol. 18, no. C, 2020, p. 100563, https://doi.org/10.1016/j.mtener.2020.100563.