Excimer laser electrochemical etching n-Si in the KOH solution

• Published in: Optics and lasers in engineering Vol. 48; no. 5; pp. 570 - 574
• Main Authors: Long, Yuhong, Shi, Tielin, Xiong, Liangcai
• Format: Journal Article
• Language: English
• Published: Kidlington Elsevier Ltd 01.05.2010; Elsevier
• Subjects: Electrochemical; Electrochemical etching; Electrolytes; Etching; Exact sciences and technology; Excimer laser; Excimer lasers; Fundamental areas of phenomenology (including applications); Gas lasers including excimer and metal-vapor lasers; Laser shock; Lasers; Mathematical models; Micromachining; Optics; Physics; Silicon; Laser shock; Etching; Silicon; Excimer laser; Electrochemical; Digital simulation; Radiation sources; Micromachining; Excimer lasers; Gas lasers; Microstructure

To further understand the behavior of laser-induced electrochemical etching process, the experiments of micromachining silicon by laser-induced electrochemical etching were carried out. 248 nm excimer laser as light source was adopted in this work with the power of 10 9 W/cm 2 for the first time and...