Properties of nitrided layers formed during plasma nitriding of commercially pure Ti and Ti–6Al–4V alloy

• Published in: Surface & coatings technology Vol. 206; no. 8; pp. 2287 - 2292
• Main Authors: Farè, S., Lecis, N., Vedani, M., Silipigni, A., Favoino, P.
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 15.01.2012; Elsevier
• Subjects: Applied sciences; Cross-disciplinary physics: materials science; rheology; Diffusion; Diffusion layers; Elemental depth profiles; Exact sciences and technology; Fracture mechanics; Heat treatment; Ion nitriding; Materials science; Metals. Metallurgy; Microstructure; Nitriding; Physics; Plasma nitriding; Production techniques; Scratch test; Surface treatments; Thermochemical treatment and diffusion treatment; Titanium; Titanium base alloys; Titanium nitride; Titanium; Plasma nitriding; Microstructure; Elemental depth profiles; Scratch test; Thermochemical treatment; Scratching test; Plasma; Vanadium alloys; Nitrided layer; Surface treatments; Titanium base alloys; Aluminium alloys; Nitridation; Depth profiles; Concentration distribution

An investigation was carried out on commercially pure titanium and on a Ti–6Al–4V alloy plasma nitrided at 730 °C according to different conditions. Diffusion of nitrogen and formation of compound layer were very limited for the shortest processing times of 20 h in both materials while the combinati...