Wafer-scale single-crystal monolayer graphene grown on sapphire substrate

The growth of inch-scale high-quality graphene on insulating substrates is desirable for electronic and optoelectronic applications, but remains challenging due to the lack of metal catalysis. Here we demonstrate the wafer-scale synthesis of adlayer-free ultra-flat single-crystal monolayer graphene...

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Published inNature materials Vol. 21; no. 7; pp. 740 - 747
Main Authors Li, Junzhu, Chen, Mingguang, Samad, Abdus, Dong, Haocong, Ray, Avijeet, Zhang, Junwei, Jiang, Xiaochuan, Schwingenschlögl, Udo, Domke, Jari, Chen, Cailing, Han, Yu, Fritz, Torsten, Ruoff, Rodney S., Tian, Bo, Zhang, Xixiang
Format Journal Article
LanguageEnglish
Published London Nature Publishing Group UK 01.07.2022
Nature Publishing Group
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Abstract The growth of inch-scale high-quality graphene on insulating substrates is desirable for electronic and optoelectronic applications, but remains challenging due to the lack of metal catalysis. Here we demonstrate the wafer-scale synthesis of adlayer-free ultra-flat single-crystal monolayer graphene on sapphire substrates. We converted polycrystalline Cu foil placed on Al 2 O 3 (0001) into single-crystal Cu(111) film via annealing, and then achieved epitaxial growth of graphene at the interface between Cu(111) and Al 2 O 3 (0001) by multi-cycle plasma etching-assisted–chemical vapour deposition. Immersion in liquid nitrogen followed by rapid heating causes the Cu(111) film to bulge and peel off easily, while the graphene film remains on the sapphire substrate without degradation. Field-effect transistors fabricated on as-grown graphene exhibited good electronic transport properties with high carrier mobilities. This work breaks a bottleneck of synthesizing wafer-scale single-crystal monolayer graphene on insulating substrates and could contribute to next-generation graphene-based nanodevices. High-quality wafer-scale single-crystal monolayer graphene is achieved on sapphire substrate, by epitaxially growing graphene at the Cu(111)/sapphire interface and then detaching Cu film via immersion in liquid nitrogen and rapid heating.
AbstractList The growth of inch-scale high-quality graphene on insulating substrates is desirable for electronic and optoelectronic applications, but remains challenging due to the lack of metal catalysis. Here we demonstrate the wafer-scale synthesis of adlayer-free ultra-flat single-crystal monolayer graphene on sapphire substrates. We converted polycrystalline Cu foil placed on Al 2 O 3 (0001) into single-crystal Cu(111) film via annealing, and then achieved epitaxial growth of graphene at the interface between Cu(111) and Al 2 O 3 (0001) by multi-cycle plasma etching-assisted–chemical vapour deposition. Immersion in liquid nitrogen followed by rapid heating causes the Cu(111) film to bulge and peel off easily, while the graphene film remains on the sapphire substrate without degradation. Field-effect transistors fabricated on as-grown graphene exhibited good electronic transport properties with high carrier mobilities. This work breaks a bottleneck of synthesizing wafer-scale single-crystal monolayer graphene on insulating substrates and could contribute to next-generation graphene-based nanodevices. High-quality wafer-scale single-crystal monolayer graphene is achieved on sapphire substrate, by epitaxially growing graphene at the Cu(111)/sapphire interface and then detaching Cu film via immersion in liquid nitrogen and rapid heating.
The growth of inch-scale high-quality graphene on insulating substrates is desirable for electronic and optoelectronic applications, but remains challenging due to the lack of metal catalysis. Here we demonstrate the wafer-scale synthesis of adlayer-free ultra-flat single-crystal monolayer graphene on sapphire substrates. We converted polycrystalline Cu foil placed on Al O (0001) into single-crystal Cu(111) film via annealing, and then achieved epitaxial growth of graphene at the interface between Cu(111) and Al O (0001) by multi-cycle plasma etching-assisted-chemical vapour deposition. Immersion in liquid nitrogen followed by rapid heating causes the Cu(111) film to bulge and peel off easily, while the graphene film remains on the sapphire substrate without degradation. Field-effect transistors fabricated on as-grown graphene exhibited good electronic transport properties with high carrier mobilities. This work breaks a bottleneck of synthesizing wafer-scale single-crystal monolayer graphene on insulating substrates and could contribute to next-generation graphene-based nanodevices.
The growth of inch-scale high-quality graphene on insulating substrates is desirable for electronic and optoelectronic applications, but remains challenging due to the lack of metal catalysis. Here we demonstrate the wafer-scale synthesis of adlayer-free ultra-flat single-crystal monolayer graphene on sapphire substrates. We converted polycrystalline Cu foil placed on Al2O3(0001) into single-crystal Cu(111) film via annealing, and then achieved epitaxial growth of graphene at the interface between Cu(111) and Al2O3(0001) by multi-cycle plasma etching-assisted-chemical vapour deposition. Immersion in liquid nitrogen followed by rapid heating causes the Cu(111) film to bulge and peel off easily, while the graphene film remains on the sapphire substrate without degradation. Field-effect transistors fabricated on as-grown graphene exhibited good electronic transport properties with high carrier mobilities. This work breaks a bottleneck of synthesizing wafer-scale single-crystal monolayer graphene on insulating substrates and could contribute to next-generation graphene-based nanodevices.The growth of inch-scale high-quality graphene on insulating substrates is desirable for electronic and optoelectronic applications, but remains challenging due to the lack of metal catalysis. Here we demonstrate the wafer-scale synthesis of adlayer-free ultra-flat single-crystal monolayer graphene on sapphire substrates. We converted polycrystalline Cu foil placed on Al2O3(0001) into single-crystal Cu(111) film via annealing, and then achieved epitaxial growth of graphene at the interface between Cu(111) and Al2O3(0001) by multi-cycle plasma etching-assisted-chemical vapour deposition. Immersion in liquid nitrogen followed by rapid heating causes the Cu(111) film to bulge and peel off easily, while the graphene film remains on the sapphire substrate without degradation. Field-effect transistors fabricated on as-grown graphene exhibited good electronic transport properties with high carrier mobilities. This work breaks a bottleneck of synthesizing wafer-scale single-crystal monolayer graphene on insulating substrates and could contribute to next-generation graphene-based nanodevices.
The growth of inch-scale high-quality graphene on insulating substrates is desirable for electronic and optoelectronic applications, but remains challenging due to the lack of metal catalysis. Here we demonstrate the wafer-scale synthesis of adlayer-free ultra-flat single-crystal monolayer graphene on sapphire substrates. We converted polycrystalline Cu foil placed on Al2O3(0001) into single-crystal Cu(111) film via annealing, and then achieved epitaxial growth of graphene at the interface between Cu(111) and Al2O3(0001) by multi-cycle plasma etching-assisted–chemical vapour deposition. Immersion in liquid nitrogen followed by rapid heating causes the Cu(111) film to bulge and peel off easily, while the graphene film remains on the sapphire substrate without degradation. Field-effect transistors fabricated on as-grown graphene exhibited good electronic transport properties with high carrier mobilities. This work breaks a bottleneck of synthesizing wafer-scale single-crystal monolayer graphene on insulating substrates and could contribute to next-generation graphene-based nanodevices.High-quality wafer-scale single-crystal monolayer graphene is achieved on sapphire substrate, by epitaxially growing graphene at the Cu(111)/sapphire interface and then detaching Cu film via immersion in liquid nitrogen and rapid heating.
Author Zhang, Xixiang
Dong, Haocong
Han, Yu
Jiang, Xiaochuan
Li, Junzhu
Schwingenschlögl, Udo
Samad, Abdus
Chen, Cailing
Domke, Jari
Chen, Mingguang
Ray, Avijeet
Zhang, Junwei
Tian, Bo
Fritz, Torsten
Ruoff, Rodney S.
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  organization: Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), Department of Chemistry, Ulsan National Institute of Science and Technology (UNIST), Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), School of Chemical Engineering and Energy Science, Ulsan National Institute of Science and Technology (UNIST)
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  organization: Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST)
BackLink https://www.ncbi.nlm.nih.gov/pubmed/35058609$$D View this record in MEDLINE/PubMed
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ContentType Journal Article
Copyright The Author(s), under exclusive licence to Springer Nature Limited 2022
2022. The Author(s), under exclusive licence to Springer Nature Limited.
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Snippet The growth of inch-scale high-quality graphene on insulating substrates is desirable for electronic and optoelectronic applications, but remains challenging...
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SubjectTerms 140/133
142/126
639/301/357/1018
639/301/357/551
639/301/357/918/1055
Aluminum oxide
Biomaterials
Catalysis
Chemical vapor deposition
Chemistry and Materials Science
Condensed Matter Physics
Crystal growth
Crystals
Electron transport
Epitaxial growth
Field effect transistors
Graphene
Heating
Liquid nitrogen
Materials Science
Metal foils
Monolayers
Nanotechnology
Nanotechnology devices
Nitrogen
Optical and Electronic Materials
Optoelectronics
Plasma etching
Sapphire
Semiconductor devices
Single crystals
Submerging
Substrates
Transport properties
Work breaks
Title Wafer-scale single-crystal monolayer graphene grown on sapphire substrate
URI https://link.springer.com/article/10.1038/s41563-021-01174-1
https://www.ncbi.nlm.nih.gov/pubmed/35058609
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https://www.proquest.com/docview/2622286371
Volume 21
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