The effect of bias-temperature stress on Na+ incorporation into thin insulating films

• Published in: Analytical and bioanalytical chemistry Vol. 400; no. 3; pp. 649 - 657
• Main Authors: Krivec, Stefan, Buchmayr, Michael, Detzel, Thomas, Froemling, Till, Fleig, Juergen, Hutter, Herbert
• Format: Journal Article
• Language: English
• Published: Berlin/Heidelberg Springer-Verlag 01.05.2011
• Subjects: activation energy; Analytical Chemistry; Biochemistry; Characterization and Evaluation of Materials; Chemistry; Chemistry and Materials Science; Food Science; insulating materials; Insulators; Laboratory Medicine; mass spectrometry; Monitoring/Environmental Analysis; nitrogen; Original Paper; permeability; Polymethyl methacrylates; polymethylmethacrylate; silica; Silicon; Silicon dioxide; Silicon nitride; sodium; Stresses; temperature; Thin films; Transport; Bias-temperature stress; ToF-SIMS; Barrier layers; Mobile ions

The action of Na + incorporation into thin insulating films and transport therein under influence of a bias voltage and temperature (BT stress) is the subject of this work. Deposited onto highly n -doped Si wafers, the insulators get BT stressed and subsequently investigated by means of time-of-flig...