Free‐Standing Molecularly Thin Amorphous Silica Nanosheets

Recent progress in 2D materials has initiated new fields of molecularly thin amorphous materials with mysterious properties and structures. However, designed synthesis of molecularly thin amorphous silica still remains a challenge; whether free‐standing molecularly thin amorphous silica nanosheets c...

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Published inSmall (Weinheim an der Bergstrasse, Germany) Vol. 19; no. 22; pp. e2300022 - n/a
Main Authors Yamamoto, Eisuke, Fujihara, Kosuke, Takezaki, Yuma, Ito, Kentaro, Shi, Yue, Kobayashi, Makoto, Osada, Minoru
Format Journal Article
LanguageEnglish
Published Germany Wiley Subscription Services, Inc 01.06.2023
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Abstract Recent progress in 2D materials has initiated new fields of molecularly thin amorphous materials with mysterious properties and structures. However, designed synthesis of molecularly thin amorphous silica still remains a challenge; whether free‐standing molecularly thin amorphous silica nanosheets can exist is unclear. Here, this issue is addressed by using a new chemical protocol; solid‐state surfactant lamellae with ordered alkyl‐chain arrangements can serve as superior templates guiding free‐standing amorphous silica nanosheets. Simple sonication of the lamellar hybrids allows exfoliation into monolayer amorphous silica nanosheets with 0.9 nm thickness. In addition, the nanosheets show the distinctive feature of high colloidal stability that enables atomic layer engineering of silica nanocoatings and dielectric nanofilms. The approach may shed new light on the properties and applications of old silica. A chemical protocol is established for free‐standing molecularly thin nanosheets; solid‐state surfactant lamellae can serve as templates guiding amorphous silica nanosheets. Delamination of the lamellar hybrids with ordered alkyl‐chain arrangement allows for free‐standing amorphous silica nanosheets with 0.9 nm in thickness. The nanosheets show high colloidal stability that enables atomic layer engineering of film with a highly insulating property.
AbstractList Recent progress in 2D materials has initiated new fields of molecularly thin amorphous materials with mysterious properties and structures. However, designed synthesis of molecularly thin amorphous silica still remains a challenge; whether free-standing molecularly thin amorphous silica nanosheets can exist is unclear. Here, this issue is addressed by using a new chemical protocol; solid-state surfactant lamellae with ordered alkyl-chain arrangements can serve as superior templates guiding free-standing amorphous silica nanosheets. Simple sonication of the lamellar hybrids allows exfoliation into monolayer amorphous silica nanosheets with 0.9 nm thickness. In addition, the nanosheets show the distinctive feature of high colloidal stability that enables atomic layer engineering of silica nanocoatings and dielectric nanofilms. The approach may shed new light on the properties and applications of old silica.
Recent progress in 2D materials has initiated new fields of molecularly thin amorphous materials with mysterious properties and structures. However, designed synthesis of molecularly thin amorphous silica still remains a challenge; whether free‐standing molecularly thin amorphous silica nanosheets can exist is unclear. Here, this issue is addressed by using a new chemical protocol; solid‐state surfactant lamellae with ordered alkyl‐chain arrangements can serve as superior templates guiding free‐standing amorphous silica nanosheets. Simple sonication of the lamellar hybrids allows exfoliation into monolayer amorphous silica nanosheets with 0.9 nm thickness. In addition, the nanosheets show the distinctive feature of high colloidal stability that enables atomic layer engineering of silica nanocoatings and dielectric nanofilms. The approach may shed new light on the properties and applications of old silica.
Abstract Recent progress in 2D materials has initiated new fields of molecularly thin amorphous materials with mysterious properties and structures. However, designed synthesis of molecularly thin amorphous silica still remains a challenge; whether free‐standing molecularly thin amorphous silica nanosheets can exist is unclear. Here, this issue is addressed by using a new chemical protocol; solid‐state surfactant lamellae with ordered alkyl‐chain arrangements can serve as superior templates guiding free‐standing amorphous silica nanosheets. Simple sonication of the lamellar hybrids allows exfoliation into monolayer amorphous silica nanosheets with 0.9 nm thickness. In addition, the nanosheets show the distinctive feature of high colloidal stability that enables atomic layer engineering of silica nanocoatings and dielectric nanofilms. The approach may shed new light on the properties and applications of old silica.
Recent progress in 2D materials has initiated new fields of molecularly thin amorphous materials with mysterious properties and structures. However, designed synthesis of molecularly thin amorphous silica still remains a challenge; whether free‐standing molecularly thin amorphous silica nanosheets can exist is unclear. Here, this issue is addressed by using a new chemical protocol; solid‐state surfactant lamellae with ordered alkyl‐chain arrangements can serve as superior templates guiding free‐standing amorphous silica nanosheets. Simple sonication of the lamellar hybrids allows exfoliation into monolayer amorphous silica nanosheets with 0.9 nm thickness. In addition, the nanosheets show the distinctive feature of high colloidal stability that enables atomic layer engineering of silica nanocoatings and dielectric nanofilms. The approach may shed new light on the properties and applications of old silica. A chemical protocol is established for free‐standing molecularly thin nanosheets; solid‐state surfactant lamellae can serve as templates guiding amorphous silica nanosheets. Delamination of the lamellar hybrids with ordered alkyl‐chain arrangement allows for free‐standing amorphous silica nanosheets with 0.9 nm in thickness. The nanosheets show high colloidal stability that enables atomic layer engineering of film with a highly insulating property.
Author Fujihara, Kosuke
Takezaki, Yuma
Shi, Yue
Osada, Minoru
Kobayashi, Makoto
Yamamoto, Eisuke
Ito, Kentaro
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Keywords amorphous silica
2D assembly
bottom-up synthesis
solid surfactants
nanosheets
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Snippet Recent progress in 2D materials has initiated new fields of molecularly thin amorphous materials with mysterious properties and structures. However, designed...
Abstract Recent progress in 2D materials has initiated new fields of molecularly thin amorphous materials with mysterious properties and structures. However,...
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StartPage e2300022
SubjectTerms 2D assembly
Amorphous materials
amorphous silica
bottom‐up synthesis
Nanosheets
Nanotechnology
Silicon dioxide
solid surfactants
Thickness
Two dimensional materials
Title Free‐Standing Molecularly Thin Amorphous Silica Nanosheets
URI https://onlinelibrary.wiley.com/doi/abs/10.1002%2Fsmll.202300022
https://www.ncbi.nlm.nih.gov/pubmed/36855026
https://www.proquest.com/docview/2821264725
https://search.proquest.com/docview/2781213286
Volume 19
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