Structural and electrical properties of magnetron sputtered Ti(ON) thin films: The case of TiN doped in situ with oxygen

• Published in: Journal of power sources Vol. 194; no. 1; pp. 93 - 103
• Main Authors: Trenczek-Zajac, A., Radecka, M., Zakrzewska, K., Brudnik, A., Kusior, E., Bourgeois, S., de Lucas, M.C. Marco, Imhoff, L.
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01.10.2009; Elsevier
• Subjects: Applied sciences; Energy; Exact sciences and technology; Magnetron sputtering; Natural energy; Optical properties; Oxygen doping; Physics; Solar energy; Thin films; Titanium oxynitride; Thin films; Oxygen doping; Magnetron sputtering; Optical properties; Titanium oxynitride; Scanning electron microscopy; Electrical conductivity; Electrical properties; Photocatalysis; Doping; Titanium nitride; Transition metal; Thin film; Electrical measurement; Solar energy; Electric resistivity; Photoelectron spectrometry; Oxidation; Raman spectrometry; X ray diffractometry

Incorporation of oxygen into TiN lattice results in formation of titanium oxynitrides, TiO x N y that have become particularly interesting for photocatalytic applications. Elaboration as well as characterization of TiN and in situ oxygen-doped thin films is the subject of this paper. Thin films, 250...