Structural and electrical properties of magnetron sputtered Ti(ON) thin films: The case of TiN doped in situ with oxygen

• Published in: Journal of power sources Vol. 194; no. 1; pp. 93 - 103
• Main Authors: Trenczek-Zajac, A., Radecka, M., Zakrzewska, K., Brudnik, A., Kusior, E., Bourgeois, S., de Lucas, M.C. Marco, Imhoff, L.
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01.10.2009; Elsevier
• Subjects: Applied sciences; Energy; Exact sciences and technology; Magnetron sputtering; Natural energy; Optical properties; Oxygen doping; Physics; Solar energy; Thin films; Titanium oxynitride; Thin films; Oxygen doping; Magnetron sputtering; Optical properties; Titanium oxynitride; Scanning electron microscopy; Electrical conductivity; Electrical properties; Photocatalysis; Doping; Titanium nitride; Transition metal; Thin film; Electrical measurement; Solar energy; Electric resistivity; Photoelectron spectrometry; Oxidation; Raman spectrometry; X ray diffractometry
• ISSN: 0378-7753; 1873-2755
• DOI: 10.1016/j.jpowsour.2008.12.112

Incorporation of oxygen into TiN lattice results in formation of titanium oxynitrides, TiO x N y that have become particularly interesting for photocatalytic applications. Elaboration as well as characterization of TiN and in situ oxygen-doped thin films is the subject of this paper. Thin films, 250–320 nm in thickness, have been deposited by dc-pulsed magnetron reactive sputtering from Ti target under controllable gas flows of Ar, N 2 and O 2. Optical monitoring of Ti plasma emission line at λ = 500 nm has been implemented in order to stabilize the sputtering rate. Scanning electron microscopy (SEM), X-ray diffraction in grazing incidence (GIXRD), micro-Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), optical spectrophotometry and four-point probe electrical resistivity measurements have been performed in order to follow evolution of film physical parameters as a function of the oxygen flow rate η O 2 at which the films were deposited. The relationship between η O 2 expressed in standard cubic centimetres per minute, sccm and the nitrogen/oxygen content in thin films has been established by means of the analysis of the XPS spectra. GIXRD studies indicate that incorporation of oxygen results in a progressive loss of preferential orientation in 〈1 1 1〉 direction, a change in the grain size from 16 nm for TiN to about 3 nm for films deposited at η O 2 = 1.32   sccm and a decrease in the lattice constant. A systematic shift of all X-ray diffraction (XRD) lines towards higher diffraction angles is consistent with substitution of oxygen for nitrogen. Micro-Raman investigations indicate amorphisation of thin films upon oxidation. Binding energies determined from fitting of the XPS results concerning the N1s and Ti2p lines give evidence of the presence of TiO x N y compound. Red-shift of the plasma reflectance edge upon TiN oxidation is correlated with a decreased carrier concentration. Metal–semiconductor transition can be expected on the basis of the electrical conductivity decrease and development of the fundamental absorption across the forbidden band of TiO 2 upon increase in the oxygen flow rate. Additional absorption feature in the visible range, being a consequence of coexistence of free-electron and interband absorption within almost the same spectral range ( λ = 400–600 nm) seems to be very promising for photocatalytic applications of titanium oxynitride thin films.