Effects of deposition conditions on the ferroelectric properties of (Al1−xScx)N thin films - Yasuoka, Shinnosuke; Shimizu, Takao; Tateyama, Akinori; Uehara, Masato; Yamada, Hiroshi; Akiyama, Morito; Hiranaga, Yoshiomi; Cho, Yasuo; Funakubo, Hiroshi (Journal of applied physics, 2020)
Keywords: Applied physics; Electric fields; Ferroelectric materials; Ferroelectricity; Gases; Magnetron sputtering; Polarization; Silicon dioxide; Silicon substrates; Thick films; Thickness; Thin films; Titanium oxides