SiC coatings for first-wall candidate materials by R.F. sputtering

The r.f. sputtering technique was applied to form SiC coating films on first-wall candidate materials such as molybdenum, stainless steel and pyrolytic carbon at various temperatures. The coating films were examined by means of scanning electron microscopy, X-ray diffraction, Auger electron spectros...

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Published inThin solid films Vol. 63; no. 2; pp. 237 - 242
Main Authors Hirohata, Yuhko, Kobayashi, Masashi, Maeda, Shigeru, Nakamura, Kazuyuki, Mohri, Mamoru, Watanabe, Kuniaki, Yamashina, Toshiro
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.11.1979
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Abstract The r.f. sputtering technique was applied to form SiC coating films on first-wall candidate materials such as molybdenum, stainless steel and pyrolytic carbon at various temperatures. The coating films were examined by means of scanning electron microscopy, X-ray diffraction, Auger electron spectroscopy and roughness factor (RF) measurements. It was found that the coating films consisted of α-SiC and grew at relatively low temperatures, namely 300 °C, 600 °C and 800 °C on molybdenum, 304 stainless steel and pyrolytic carbon surfaces, respectively. The surfaces of α-SiC films grown above these temperatures were relatively smooth with small RFs in comparison with those prepared at lower temperatures. Lower temperature deposition gave rise to amorphous and rough coating films with considerably larger RFs.
AbstractList Rf sputtering was applied to form alpha-SiC coating films on 1st-wall candidate materials such as Mo, stainless steel, and pyrolytic C at relatively low temps. in comparison with other coating techniques.
Proc. Int. Conf. on Metallurgical Coatings, San Diego, U.S.A., Apr. 1979. The r.f. sputtering technique was applied to form SiC coating films on first-wall candidate materials such as Mo stainless steel and pyrolytic carbon at various temperatures. The coating films were examined by means of scanning electron microscopy, X-ray diffraction, Auger electron spectroscopy and roughness factor (RF) measurements. It was found that the coating films consisted of alpha -SiC and grew relatively low temperatures, namely 300, 600, and 800 deg C on Mo, 304 stainless steel and pyrolytic carbon surfaces, respectively. The surfaces of alpha -SiC films grown above these temperatures were relatively smooth with small RFs in comparison with those prepared at lower temperatures. Lower temperature deposition gave rise to amorphous and rough coating films with considerably larger RFs. 13 ref.--AA
The r.f. sputtering technique was applied to form SiC coating films on first-wall candidate materials such as molybdenum, stainless steel and pyrolytic carbon at various temperatures. The coating films were examined by means of scanning electron microscopy, X-ray diffraction, Auger electron spectroscopy and roughness factor (RF) measurements. It was found that the coating films consisted of α-SiC and grew at relatively low temperatures, namely 300 °C, 600 °C and 800 °C on molybdenum, 304 stainless steel and pyrolytic carbon surfaces, respectively. The surfaces of α-SiC films grown above these temperatures were relatively smooth with small RFs in comparison with those prepared at lower temperatures. Lower temperature deposition gave rise to amorphous and rough coating films with considerably larger RFs.
Author Hirohata, Yuhko
Watanabe, Kuniaki
Mohri, Mamoru
Nakamura, Kazuyuki
Kobayashi, Masashi
Maeda, Shigeru
Yamashina, Toshiro
Author_xml – sequence: 1
  givenname: Yuhko
  surname: Hirohata
  fullname: Hirohata, Yuhko
– sequence: 2
  givenname: Masashi
  surname: Kobayashi
  fullname: Kobayashi, Masashi
– sequence: 3
  givenname: Shigeru
  surname: Maeda
  fullname: Maeda, Shigeru
– sequence: 4
  givenname: Kazuyuki
  surname: Nakamura
  fullname: Nakamura, Kazuyuki
– sequence: 5
  givenname: Mamoru
  surname: Mohri
  fullname: Mohri, Mamoru
– sequence: 6
  givenname: Kuniaki
  surname: Watanabe
  fullname: Watanabe, Kuniaki
– sequence: 7
  givenname: Toshiro
  surname: Yamashina
  fullname: Yamashina, Toshiro
BookMark eNqNkE1LAzEQhoNUsK3-Aw85iR625muTzUXQYlUoCH5AbyGbzZbIdrcmWaX_3qwVj-Jlhpl55h3mnYBR27UWgFOMZhhhfokQQxlHEp0LeSERIjhbHYAxLoTMiKB4BMa_yBGYhPCGEMKE0DG4eXZzaDodXbsOsO48rJ0PMfvUTQONbitX6WjhJgXvdBNguYNPs8UMhm0fh167PgaHdZrYk588Ba-L25f5fbZ8vHuYXy8zwyiJGRVUMIZ1yTin0lY55yXPKy4lrbnVrJKo4HVJi7ImlGiRJw4bUhBGUlVqOgVne92t7957G6LauGBs0-jWdn1QhOYCFwX7F5huiQSyPWh8F4K3tdp6t9F-pzBSg7NqsE0Ntikh1bezapXWrvZrNn374axXwTjbGls5b01UVef-FvgCovh_eA
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Cites_doi 10.1143/JJAP.11.607
10.1016/0022-3115(78)90146-0
10.1016/0040-6090(76)90353-9
10.1016/0040-6090(77)90106-7
10.1063/1.1657083
10.1063/1.1653238
10.1016/0021-9517(70)90100-4
10.1016/0040-6090(77)90103-1
10.1016/0040-6090(76)90370-9
10.1063/1.1754939
10.1016/0040-6090(77)90096-7
10.1143/JJAP.8.401
10.1016/0040-6090(77)90132-8
ContentType Journal Article
Copyright 1979
Copyright_xml – notice: 1979
DBID AAYXX
CITATION
7QQ
8FD
JG9
8BQ
DOI 10.1016/0040-6090(79)90021-X
DatabaseName CrossRef
Ceramic Abstracts
Technology Research Database
Materials Research Database
METADEX
DatabaseTitle CrossRef
Materials Research Database
Technology Research Database
Ceramic Abstracts
METADEX
DatabaseTitleList Materials Research Database
Materials Research Database
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
EISSN 1879-2731
EndPage 242
ExternalDocumentID 10_1016_0040_6090_79_90021_X
004060907990021X
GroupedDBID --K
--M
-~X
.DC
.~1
0R~
123
1B1
1RT
1~.
1~5
29Q
4.4
457
4G.
5VS
6TJ
7-5
71M
8P~
9JN
AABNK
AABXZ
AACTN
AAEDT
AAEDW
AAEPC
AAIAV
AAIKJ
AAKOC
AALRI
AAOAW
AAQFI
AAQXK
AAXUO
AAYJJ
ABFNM
ABFRF
ABJNI
ABMAC
ABNEU
ABXDB
ABXRA
ABYKQ
ACBEA
ACDAQ
ACFVG
ACGFO
ACGFS
ACNNM
ACRLP
ADBBV
ADEZE
ADMUD
AEBSH
AEFWE
AEKER
AENEX
AEZYN
AFFNX
AFKWA
AFRZQ
AFTJW
AGHFR
AGUBO
AGYEJ
AHHHB
AIEXJ
AIKHN
AITUG
AIVDX
AJBFU
AJOXV
ALMA_UNASSIGNED_HOLDINGS
AMFUW
AMRAJ
ASPBG
AVWKF
AXJTR
AZFZN
BBWZM
BKOJK
BLXMC
CS3
DU5
EBS
EFJIC
EFLBG
EJD
EO8
EO9
EP2
EP3
F5P
FDB
FEDTE
FGOYB
FIRID
FNPLU
FYGXN
G-2
G-Q
G8K
GBLVA
HMV
HVGLF
HX~
HZ~
IHE
J1W
KOM
M24
M38
M41
MAGPM
MO0
N9A
NDZJH
O-L
O9-
OAUVE
OGIMB
OZT
P-8
P-9
P2P
PC.
Q38
R2-
RIG
RNS
ROL
RPZ
SDF
SDG
SDP
SES
SEW
SMS
SPC
SPCBC
SPD
SPG
SSM
SSQ
SSZ
T5K
TWZ
VOH
WH7
WUQ
XFK
ZMT
~G-
AAXKI
AAYXX
AFJKZ
AKRWK
CITATION
7QQ
8FD
JG9
8BQ
ID FETCH-LOGICAL-c432t-3737441ab46639ed566b65d6993f6ea4d9086fb38bf232a754661c282422a7ba3
ISSN 0040-6090
IngestDate Fri Aug 16 21:46:19 EDT 2024
Fri Aug 16 21:45:35 EDT 2024
Thu Sep 26 19:37:17 EDT 2024
Fri Feb 23 02:29:06 EST 2024
IsPeerReviewed true
IsScholarly true
Issue 2
Language English
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c432t-3737441ab46639ed566b65d6993f6ea4d9086fb38bf232a754661c282422a7ba3
Notes ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
PQID 23570867
PQPubID 23500
PageCount 6
ParticipantIDs proquest_miscellaneous_23571884
proquest_miscellaneous_23570867
crossref_primary_10_1016_0040_6090_79_90021_X
elsevier_sciencedirect_doi_10_1016_0040_6090_79_90021_X
PublicationCentury 1900
PublicationDate 1979-11-01
PublicationDateYYYYMMDD 1979-11-01
PublicationDate_xml – month: 11
  year: 1979
  text: 1979-11-01
  day: 01
PublicationDecade 1970
PublicationTitle Thin solid films
PublicationYear 1979
Publisher Elsevier B.V
Publisher_xml – name: Elsevier B.V
References Onuma (BIB11) 1969; 8
Chin, Gantzel, Hudson (BIB1) 1977; 40
Kahn, Summergrad (BIB4) 1967; 11
Muench, Pfaffeneder (BIB3) 1976; 31
Nishino, Mastunami, Okada, Tanaka (BIB7) 1977; 40
Mastumoto, Suzuki, Ueda (BIB8) 1972; 11
Murayama, Takao (BIB12) 1977; 40
Learn, Haq (BIB9) 1970; 17
Haq, Learn (BIB10) 1969; 40
Watanabe, Yamashina, Watanabe, Sasaki, Mohri, Yamashina (BIB13) 1970; 17
Wasa, Nagai, Hayakawa (BIB6) 1976; 31
Price (BIB2) 1969; 48
Federer (BIB5) 1977; 40
Federer (10.1016/0040-6090(79)90021-X_BIB5) 1977; 40
Nishino (10.1016/0040-6090(79)90021-X_BIB7) 1977; 40
Learn (10.1016/0040-6090(79)90021-X_BIB9) 1970; 17
Kahn (10.1016/0040-6090(79)90021-X_BIB4) 1967; 11
Watanabe (10.1016/0040-6090(79)90021-X_BIB13_2) 1978; 76/77
Chin (10.1016/0040-6090(79)90021-X_BIB1) 1977; 40
Price (10.1016/0040-6090(79)90021-X_BIB2) 1969; 48
Muench (10.1016/0040-6090(79)90021-X_BIB3) 1976; 31
Onuma (10.1016/0040-6090(79)90021-X_BIB11) 1969; 8
Wasa (10.1016/0040-6090(79)90021-X_BIB6) 1976; 31
Haq (10.1016/0040-6090(79)90021-X_BIB10) 1969; 40
Watanabe (10.1016/0040-6090(79)90021-X_BIB13_1) 1970; 17
Murayama (10.1016/0040-6090(79)90021-X_BIB12) 1977; 40
Mastumoto (10.1016/0040-6090(79)90021-X_BIB8) 1972; 11
References_xml – volume: 40
  start-page: 89
  year: 1977
  ident: BIB5
  publication-title: Thin Solid Films
  contributor:
    fullname: Federer
– volume: 17
  start-page: 26
  year: 1970
  ident: BIB9
  publication-title: Appl. Phys. Lett.
  contributor:
    fullname: Haq
– volume: 17
  start-page: 272
  year: 1970
  ident: BIB13
  publication-title: J. Catal.
  contributor:
    fullname: Yamashina
– volume: 11
  start-page: 12
  year: 1967
  ident: BIB4
  publication-title: Appl. Phys. Lett.
  contributor:
    fullname: Summergrad
– volume: 40
  start-page: 57
  year: 1977
  ident: BIB1
  publication-title: Thin Solid Films
  contributor:
    fullname: Hudson
– volume: 40
  start-page: L27
  year: 1977
  ident: BIB7
  publication-title: Thin Solid Films
  contributor:
    fullname: Tanaka
– volume: 48
  start-page: 859
  year: 1969
  ident: BIB2
  publication-title: Ceram. Bull.
  contributor:
    fullname: Price
– volume: 11
  start-page: 607
  year: 1972
  ident: BIB8
  publication-title: Jpn. J. Appl. Phys.
  contributor:
    fullname: Ueda
– volume: 31
  start-page: 235
  year: 1976
  ident: BIB6
  publication-title: Thin Solid Films
  contributor:
    fullname: Hayakawa
– volume: 8
  start-page: 401
  year: 1969
  ident: BIB11
  publication-title: Jpn. J. Appl. Phys.
  contributor:
    fullname: Onuma
– volume: 40
  start-page: 309
  year: 1977
  ident: BIB12
  publication-title: Thin Solid Films
  contributor:
    fullname: Takao
– volume: 40
  start-page: 431
  year: 1969
  ident: BIB10
  publication-title: J. Appl. Phys.
  contributor:
    fullname: Learn
– volume: 31
  start-page: 39
  year: 1976
  ident: BIB3
  publication-title: Thin Solid Films
  contributor:
    fullname: Pfaffeneder
– volume: 11
  start-page: 607
  year: 1972
  ident: 10.1016/0040-6090(79)90021-X_BIB8
  publication-title: Jpn. J. Appl. Phys.
  doi: 10.1143/JJAP.11.607
  contributor:
    fullname: Mastumoto
– volume: 76/77
  start-page: 235
  year: 1978
  ident: 10.1016/0040-6090(79)90021-X_BIB13_2
  publication-title: J. Nucl. Mater.
  doi: 10.1016/0022-3115(78)90146-0
  contributor:
    fullname: Watanabe
– volume: 31
  start-page: 39
  year: 1976
  ident: 10.1016/0040-6090(79)90021-X_BIB3
  publication-title: Thin Solid Films
  doi: 10.1016/0040-6090(76)90353-9
  contributor:
    fullname: Muench
– volume: 40
  start-page: 89
  year: 1977
  ident: 10.1016/0040-6090(79)90021-X_BIB5
  publication-title: Thin Solid Films
  doi: 10.1016/0040-6090(77)90106-7
  contributor:
    fullname: Federer
– volume: 40
  start-page: 431
  year: 1969
  ident: 10.1016/0040-6090(79)90021-X_BIB10
  publication-title: J. Appl. Phys.
  doi: 10.1063/1.1657083
  contributor:
    fullname: Haq
– volume: 17
  start-page: 26
  year: 1970
  ident: 10.1016/0040-6090(79)90021-X_BIB9
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.1653238
  contributor:
    fullname: Learn
– volume: 17
  start-page: 272
  year: 1970
  ident: 10.1016/0040-6090(79)90021-X_BIB13_1
  publication-title: J. Catal.
  doi: 10.1016/0021-9517(70)90100-4
  contributor:
    fullname: Watanabe
– volume: 40
  start-page: 57
  year: 1977
  ident: 10.1016/0040-6090(79)90021-X_BIB1
  publication-title: Thin Solid Films
  doi: 10.1016/0040-6090(77)90103-1
  contributor:
    fullname: Chin
– volume: 31
  start-page: 235
  year: 1976
  ident: 10.1016/0040-6090(79)90021-X_BIB6
  publication-title: Thin Solid Films
  doi: 10.1016/0040-6090(76)90370-9
  contributor:
    fullname: Wasa
– volume: 11
  start-page: 12
  year: 1967
  ident: 10.1016/0040-6090(79)90021-X_BIB4
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.1754939
  contributor:
    fullname: Kahn
– volume: 40
  start-page: L27
  year: 1977
  ident: 10.1016/0040-6090(79)90021-X_BIB7
  publication-title: Thin Solid Films
  doi: 10.1016/0040-6090(77)90096-7
  contributor:
    fullname: Nishino
– volume: 48
  start-page: 859
  year: 1969
  ident: 10.1016/0040-6090(79)90021-X_BIB2
  publication-title: Ceram. Bull.
  contributor:
    fullname: Price
– volume: 8
  start-page: 401
  year: 1969
  ident: 10.1016/0040-6090(79)90021-X_BIB11
  publication-title: Jpn. J. Appl. Phys.
  doi: 10.1143/JJAP.8.401
  contributor:
    fullname: Onuma
– volume: 40
  start-page: 309
  year: 1977
  ident: 10.1016/0040-6090(79)90021-X_BIB12
  publication-title: Thin Solid Films
  doi: 10.1016/0040-6090(77)90132-8
  contributor:
    fullname: Murayama
SSID ssj0001223
Score 1.3327304
Snippet The r.f. sputtering technique was applied to form SiC coating films on first-wall candidate materials such as molybdenum, stainless steel and pyrolytic carbon...
Rf sputtering was applied to form alpha-SiC coating films on 1st-wall candidate materials such as Mo, stainless steel, and pyrolytic C at relatively low temps....
Proc. Int. Conf. on Metallurgical Coatings, San Diego, U.S.A., Apr. 1979. The r.f. sputtering technique was applied to form SiC coating films on first-wall...
SourceID proquest
crossref
elsevier
SourceType Aggregation Database
Publisher
StartPage 237
Title SiC coatings for first-wall candidate materials by R.F. sputtering
URI https://dx.doi.org/10.1016/0040-6090(79)90021-X
https://search.proquest.com/docview/23570867
https://search.proquest.com/docview/23571884
Volume 63
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV3db9MwELdgExI8IBggxqcfQAJVgeajcfzGNG2q2BgSa0V4smzHYdlEMqWt0PjruYvtpOJrwEuUWo6T3s-6-53tuyPkmVF6LHXJgjCN0EGJTaB4qgMVhzopYJKYMQY4vztKp_PkbT7JfS15F12yVK_0t1_GlfwPqtAGuGKU7D8g2w8KDXAP-MIVEIbrX2F8XO2OdCOXXelNPC9YVkDmgq-43awxXgXd-RFwUvsxSDXbcrQ474pTe5t16udLVY_gc6sCczV96an2tGqbE2k55qfVWdNraFAEF1iJyUb8LPB2WN42RffA8Un12bSrYWkh5Iy7GLs1dYmxAWNbz9OrS6ePqjWv1ek-m73FmdHIJs36SUPbxYJ-ZKDRjD9Hm4hnRfLBKvmd-KP3Yn9-eChme_nsKtmMGJ-Aj725c_Dh40FvcsMo6o9H4qg-RjJMX_dtLxh_6d7yOw7ygzXuKMbsFrnpfAO6Y4G-Ta6YeovcWMsYuUWudSd29eIOeQPgUw8-BfDpAD7twac9-FRd0LakA_h3yXx_b7Y7DVw5jEAncbQEUxAzIK9SJcASuSmAiKt0UqTAMMvUyKTg4J6WKs5UCTRZsgn0CzW41EkEv5SM75GNuqnNfUIz6MHGqZIG-GfBQJtwHfNMwVAyinW8TQIvIHFus54IfxwQBSpQoIJx0QlU5NuEeSkKx9wsIxMA-yVPPvVCF6DYcLdK1qZZLQTmYYI_xP7cI8yy5MGlYzwk14f5_YhsLNuVeQxkcqmeuKn0HbGQcP4
link.rule.ids 315,786,790,27957,27958
linkProvider Library Specific Holdings
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=SiC+coatings+for+first-wall+candidate+materials+by+rf+sputtering&rft.jtitle=Thin+solid+films&rft.au=Hirohata%2C+Yuko&rft.au=Kobayashi%2C+Masashi&rft.au=Maeda%2C+Shigeru&rft.date=1979-11-01&rft.issn=0040-6090&rft.volume=63&rft.issue=2&rft.spage=237&rft.epage=242&rft_id=info:doi/10.1016%2F0040-6090%2879%2990021-X&rft.externalDBID=NO_FULL_TEXT
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0040-6090&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0040-6090&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0040-6090&client=summon