APA (7th ed.) Citation

Ito, Y., Akimoto, K., Yoshida, H., Emoto, T., Kobayashi, D., & Hirose, K. (2007). High-k Gate Dielectric Films Studied by Extremely Asymmetric X-ray Diffraction and X-ray Photoelectron Spectroscopy. Journal of physics. Conference series, 83(1), 012011. https://doi.org/10.1088/1742-6596/83/1/012011

Chicago Style (17th ed.) Citation

Ito, Yuki, Koichi Akimoto, Hironori Yoshida, Takashi Emoto, Daisuke Kobayashi, and Kazuyuki Hirose. "High-k Gate Dielectric Films Studied by Extremely Asymmetric X-ray Diffraction and X-ray Photoelectron Spectroscopy." Journal of Physics. Conference Series 83, no. 1 (2007): 012011. https://doi.org/10.1088/1742-6596/83/1/012011.

MLA (9th ed.) Citation

Ito, Yuki, et al. "High-k Gate Dielectric Films Studied by Extremely Asymmetric X-ray Diffraction and X-ray Photoelectron Spectroscopy." Journal of Physics. Conference Series, vol. 83, no. 1, 2007, p. 012011, https://doi.org/10.1088/1742-6596/83/1/012011.