Thermal management strategies for gallium oxide vertical trench-fin MOSFETs

Trench-fin MOSFETs, with their near-surface heat generation and the higher-surface area afforded by their geometry for thermal management, represent a promising solution to the thermal problems frequently encountered in lateral β-Ga2O3 devices. Here, we investigate potential thermal-management strat...

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Bibliographic Details
Published inJournal of applied physics Vol. 129; no. 8
Main Authors Montgomery, Robert H., Zhang, Yuewei, Yuan, Chao, Kim, Samuel, Shi, Jingjing, Itoh, Takeki, Mauze, Akhil, Kumar, Satish, Speck, James, Graham, Samuel
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 28.02.2021
Subjects
Applied physics
Gallium oxides
Heat generation
MOSFETs
Parametric analysis
Spreaders
Thermal management
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Summary:Trench-fin MOSFETs, with their near-surface heat generation and the higher-surface area afforded by their geometry for thermal management, represent a promising solution to the thermal problems frequently encountered in lateral β-Ga2O3 devices. Here, we investigate potential thermal-management strategies for a vertical β-Ga2O3 trench-fin MOSFET through parametric analysis, offering recommendations on how best to design a device for maximal current density and excellent thermal performance. Primarily, by using a thermally conductive dielectric over the MOSFET structure, significant improvements to device power density may be achieved, aided by thermal spreading. Additionally, we find that by bonding thermal spreaders to its topside can yield significant improvements in thermal performance.
ISSN:0021-8979
1089-7550
DOI:10.1063/5.0033001