Age-based double EWMA controller and its application to CMP processes - Chen, A.; Ruey-Shan Guo (IEEE transactions on semiconductor manufacturing, 2001)
Keywords: Adjustment; Applied sciences; Argon; Chemical-mechanical polishing; Control systems; Deviation; Drift; Electronics; Electronics industry; Estimates; Exact sciences and technology; Formulations; Helium; Input variables; Microelectronic fabrication (materials and surfaces technology); Optimal control; Process control; Refining; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Semiconductor process modeling; Semiconductors; Statistics; Predictor corrector method; Microelectronic fabrication; Planarization; Mechanical polishing; Statistical analysis; Moving average; Process control; Ageing; Chemical polishing