Highly sensitive GaAs/AlGaAs heterojunction bolometer

GaAs/AlGaAs multilayer heterojunction structures with different aluminum (Al) fractions and emitter doping densities were tested to identify optimum parameters for high temperature coefficient of resistance (TCR). Higher Al fractions and lower doping densities showed higher TCR. Additionally, p-dope...

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Published inSensors and actuators. A. Physical. Vol. 167; no. 2; pp. 245 - 248
Main Authors Pitigala, P.K.D.D.P., Jayaweera, P.V.V., Matsik, S.G., Perera, A.G.U., Liu, H.C.
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Published Elsevier B.V 01.06.2011
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Abstract GaAs/AlGaAs multilayer heterojunction structures with different aluminum (Al) fractions and emitter doping densities were tested to identify optimum parameters for high temperature coefficient of resistance (TCR). Higher Al fractions and lower doping densities showed higher TCR. Additionally, p-doped heterojunction structures showed a higher TCR compared to an n-doped one with similar parameters. A p-doped multilayer superlattice heterojunction structure with 30 periods of GaAs/Al 0.57Ga 0.43As junctions, operating at room temperature showed a TCR of ∼4% and bolometer like infrared (IR) response up to 20 μm with a D* of 1.7 × 10 6 Jones. This TCR is higher than that of VO x or α-Si bolometers. At low temperatures (50 K) some of these devices have shown TCR values of over 30%.
AbstractList GaAs/AlGaAs multilayer heterojunction structures with different aluminum (Al) fractions and emitter doping densities were tested to identify optimum parameters for high temperature coefficient of resistance (TCR). Higher Al fractions and lower doping densities showed higher TCR. Additionally, p-doped heterojunction structures showed a higher TCR compared to an n-doped one with similar parameters. A p-doped multilayer superlattice heterojunction structure with 30 periods of GaAs/Al sub(0.57Ga) sub(0).43As junctions, operating at room temperature showed a TCR of [inline image]4% and bolometer like infrared (IR) response up to 20 [micro]m with a D* of 1.7 x 10[super]6 Jones. This TCR is higher than that of VO sub(x or [alpha]-Si bolometers. At low temperatures (50 K) some of these devices have shown TCR values of over 30%.)
GaAs/AlGaAs multilayer heterojunction structures with different aluminum (Al) fractions and emitter doping densities were tested to identify optimum parameters for high temperature coefficient of resistance (TCR). Higher Al fractions and lower doping densities showed higher TCR. Additionally, p-doped heterojunction structures showed a higher TCR compared to an n-doped one with similar parameters. A p-doped multilayer superlattice heterojunction structure with 30 periods of GaAs/Al₀.₅₇Ga₀.₄₃As junctions, operating at room temperature showed a TCR of ∼4% and bolometer like infrared (IR) response up to 20μm with a D* of 1.7×10⁶Jones. This TCR is higher than that of VOₓ or α-Si bolometers. At low temperatures (50K) some of these devices have shown TCR values of over 30%.
GaAs/AlGaAs multilayer heterojunction structures with different aluminum (Al) fractions and emitter doping densities were tested to identify optimum parameters for high temperature coefficient of resistance (TCR). Higher Al fractions and lower doping densities showed higher TCR. Additionally, p-doped heterojunction structures showed a higher TCR compared to an n-doped one with similar parameters. A p-doped multilayer superlattice heterojunction structure with 30 periods of GaAs/Al 0.57Ga 0.43As junctions, operating at room temperature showed a TCR of ∼4% and bolometer like infrared (IR) response up to 20 μm with a D * of 1.7 × 10 6 Jones. This TCR is higher than that of VO x or α-Si bolometers. At low temperatures (50 K) some of these devices have shown TCR values of over 30%. © 2011 Elsevier B.V. All rights reserved.
GaAs/AlGaAs multilayer heterojunction structures with different aluminum (Al) fractions and emitter doping densities were tested to identify optimum parameters for high temperature coefficient of resistance (TCR). Higher Al fractions and lower doping densities showed higher TCR. Additionally, p-doped heterojunction structures showed a higher TCR compared to an n-doped one with similar parameters. A p-doped multilayer superlattice heterojunction structure with 30 periods of GaAs/Al 0.57Ga 0.43As junctions, operating at room temperature showed a TCR of ∼4% and bolometer like infrared (IR) response up to 20 μm with a D* of 1.7 × 10 6 Jones. This TCR is higher than that of VO x or α-Si bolometers. At low temperatures (50 K) some of these devices have shown TCR values of over 30%.
Author Perera, A.G.U.
Liu, H.C.
Matsik, S.G.
Jayaweera, P.V.V.
Pitigala, P.K.D.D.P.
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  organization: Institute for Microstructural Sciences, National Research Council, Ottawa K1A 0R6, Canada
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Keywords 85.60Gz
TCR
GaAs/AlGaAs
07.57Kp
Bolometer
85.25Pb
95.55 Rg
Room temperature
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SubjectTerms Aluminum
Aluminum gallium arsenides
Bolometer
Bolometers
Density
Doping
Doping (additives)
Doping densities
electrical equipment
Emitter doping
equipment design
equipment performance
GaAs
GaAs/AlGaAs
Gallium
Gallium arsenide
Gallium arsenides
Heterojunction structures
Heterojunctions
High temperature coefficient
Highly sensitive
Infrared detectors
Infrared response
Low temperatures
Multilayer Heterojunction
Multilayers
N-doped
Optimum parameters
Phosphorus
Room temperature
TCR
temperature
Title Highly sensitive GaAs/AlGaAs heterojunction bolometer
URI https://dx.doi.org/10.1016/j.sna.2011.02.017
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