Ultrafine fabrication technique for hot electron interference/diffraction devices

• Published in: Japanese Journal of Applied Physics Vol. 33; no. 1B; pp. 925 - 928
• Main Authors: HONGO, H, MIYAMOTO, Y, SUZUKI, J, FUNAYAMA, M, MORITA, T, FURUYA, K
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Tokyo Japanese journal of applied physics 1994
• Subjects: Electromagnetism; electron and ion optics; Exact sciences and technology; Fundamental areas of phenomenology (including applications); Other topics in electromagnetism; electron and ion optics; Physics; Fabrication; Electron beams; Electron diffraction; Hot electrons; Lithography; Interference; Instrumentation; Slot

We proposed a device for observing hot electron interference by a double slit. For this purpose we had refined and improved the fabrication techniques, especially electron beam lithography; the alignment of electron beam lithography before and after crystal growth with accuracy of 100nm was reported...