Huard, C. M., Zhang, Y., Sriraman, S., Paterson, A., & Kushner, M. J. (2017). Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 35(5), . https://doi.org/10.1116/1.4973953
Chicago Style (17th ed.) CitationHuard, Chad M., Yiting Zhang, Saravanapriyan Sriraman, Alex Paterson, and Mark J. Kushner. "Role of Neutral Transport in Aspect Ratio Dependent Plasma Etching of Three-dimensional Features." Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films 35, no. 5 (2017). https://doi.org/10.1116/1.4973953.
MLA (9th ed.) CitationHuard, Chad M., et al. "Role of Neutral Transport in Aspect Ratio Dependent Plasma Etching of Three-dimensional Features." Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, vol. 35, no. 5, 2017, https://doi.org/10.1116/1.4973953.