Molecular dynamics simulation of Al–Co–Cr–Cu–Fe–Ni high entropy alloy thin film growth

• Published in: Intermetallics Vol. 68; pp. 78 - 86
• Main Authors: Xie, Lu, Brault, Pascal, Thomann, Anne-Lise, Yang, Xiao, Zhang, Yong, Shang, GuangYi
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.01.2016; Elsevier
• Subjects: Alloy development; Atomic structure; Coatings; Computational Physics; Engineering Sciences; Entropy; Formations; High-entropy alloys; Materials; Molecular dynamics; Molecular dynamics simulation; Physics; Plasmas; Silicon substrates; Simulation; Thin films; High-entropy alloys; Coatings; Molecular dynamics simulation; magnetron sputtering; High entropy alloy; thin film deposition

Molecular dynamics (MD) simulations are used to study AlCoCrCuFeNi high entropy alloy (HEA) thin film growth on a silicon (100) substrate. Effect of the atomic composition is studied on morphology and atomic scale structure. Input data are chosen to fit with experimental operating conditions of magn...