Adsorption of silica colloids onto like-charged silica surfaces of different roughness

• Published in: Colloids and surfaces. A, Physicochemical and engineering aspects Vol. 520; no. C; pp. 85 - 96
• Main Authors: Dylla-Spears, R., Wong, L., Shen, N., Steele, W., Menapace, J., Miller, P., Feit, M., Suratwala, T.
• Format: Journal Article
• Language: English
• Published: United States Elsevier B.V 05.05.2017; Elsevier
• Subjects: Adsorption; CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; Colloidal silica; DLVO theory; ENGINEERING; MATERIALS SCIENCE; Polishing; QCM; Surface roughness; Colloidal silica; Polishing; QCM; Surface roughness; Adsorption; DLVO theory

[Display omitted] •QCM-D sensors can successfully be roughened by optical finishing techniques.•Roughness increase from 1.3nm to 2.7nm boosts 50-nm SiO2 colloid adsorption by 3x.•Roughness scale relative to adsorbate size plays a role in adsorption outcome. Particle adsorption was explored in a mode...