New high current low energy ion source

We have developed a new type of ion source which is excited by a low energy and high current electron beam. The source has an extractable ion current density up to 0.62 A/cm 2 and a low acceleration voltage less than 60 V. This ion source will open a new way for low energy ion processing like damage...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 25; no. 3; pp. L252 - L253
Main Authors HARA, T, HAMAGAKI, M, SANDA, A, AOYAGI, Y, NAMBA, S
Format Journal Article
LanguageEnglish
Published Tokyo Japanese journal of applied physics 01.03.1986
Subjects
Applied sciences
Charged-particle beams
Electromagnetism; electron and ion optics
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Other techniques and industries
Physics
Electron beam
Ion source
Excitation
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Summary:We have developed a new type of ion source which is excited by a low energy and high current electron beam. The source has an extractable ion current density up to 0.62 A/cm 2 and a low acceleration voltage less than 60 V. This ion source will open a new way for low energy ion processing like damageless ion etching, ion beam crystal growth and deposition.
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.25.l252