Analytical results for the cluster size distribution in controlled deposition processes
This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto...
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Published in | Chinese physics B Vol. 19; no. 2; pp. 401 - 406 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
IOP Publishing
01.02.2010
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Subjects | |
Online Access | Get full text |
ISSN | 1674-1056 2058-3834 |
DOI | 10.1088/1674-1056/19/2/026802 |
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Abstract | This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases. |
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AbstractList | This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases. This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases. |
Author | 柯见洪 陈效双 林振权 |
AuthorAffiliation | National Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China College of Physics and Electronic Information Engineering, Wenzhou University, Wenzhou 325035, China |
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Snippet | This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island)... This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island)... |
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SubjectTerms | Clusters Deposition Evolution Islands Mathematical analysis Particle deposition Particle size distribution Surface chemistry 大小分布 控制模型 时间步长 粒子注入 表面沉积 速率方程 颗粒表面 |
Title | Analytical results for the cluster size distribution in controlled deposition processes |
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