Analytical results for the cluster size distribution in controlled deposition processes

This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto...

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Published inChinese physics B Vol. 19; no. 2; pp. 401 - 406
Main Author 柯见洪 陈效双 林振权
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.02.2010
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ISSN1674-1056
2058-3834
DOI10.1088/1674-1056/19/2/026802

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Abstract This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases.
AbstractList This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases.
This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases.
Author 柯见洪 陈效双 林振权
AuthorAffiliation National Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China College of Physics and Electronic Information Engineering, Wenzhou University, Wenzhou 325035, China
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Snippet This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island)...
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SubjectTerms Clusters
Deposition
Evolution
Islands
Mathematical analysis
Particle deposition
Particle size distribution
Surface chemistry
大小分布
控制模型
时间步长
粒子注入
表面沉积
速率方程
颗粒表面
Title Analytical results for the cluster size distribution in controlled deposition processes
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