Analytical results for the cluster size distribution in controlled deposition processes

This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster （island） size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto...

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Bibliographic Details
Published inChinese physics B Vol. 19; no. 2; pp. 401 - 406
Main Author 柯见洪 陈效双 林振权
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.02.2010
Subjects
Clusters
Deposition
Evolution
Islands
Mathematical analysis
Particle deposition
Particle size distribution
Surface chemistry
大小分布
控制模型
时间步长
粒子注入
表面沉积
速率方程
颗粒表面
Online AccessGet full text
ISSN1674-1056
2058-3834
DOI10.1088/1674-1056/19/2/026802

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Summary:This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster （island） size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases.
Bibliography:TS75
cluster growth deposition kinetic behaviour
11-5639/O4
TP273
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ISSN:1674-1056
2058-3834
DOI:10.1088/1674-1056/19/2/026802