APA (7th ed.) Citation

Kaloyeros, A. E., Pan, Y., Goff, J., & Arkles, B. (2020). Review-Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications. ECS journal of solid state science and technology, 9(6), 63006-63058. https://doi.org/10.1149/2162-8777/aba447

Chicago Style (17th ed.) Citation

Kaloyeros, Alain E., Youlin Pan, Jonathan Goff, and Barry Arkles. "Review-Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications." ECS Journal of Solid State Science and Technology 9, no. 6 (2020): 63006-63058. https://doi.org/10.1149/2162-8777/aba447.

MLA (9th ed.) Citation

Kaloyeros, Alain E., et al. "Review-Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications." ECS Journal of Solid State Science and Technology, vol. 9, no. 6, 2020, pp. 63006-63058, https://doi.org/10.1149/2162-8777/aba447.