Setup for photolithography on microscopic flakes of 2D materials by combining simple-geometry mask projection with writing

• Published in: Review of scientific instruments Vol. 93; no. 2; pp. 023901 - 23905
• Main Authors: Jindal, Vishwas, Sugunakar, Vasam, Ghosh, Sandip
• Format: Journal Article
• Language: English
• Published: United States American Institute of Physics 01.02.2022
• Subjects: Automation; Flakes; Masks; Optical filters; Photolithography; Photoresists; Projection; Scientific apparatus & instruments; Substrates; Two dimensional materials

An optical arrangement and procedure for photolithography on microscopic flakes of two-dimensional materials with an arbitrary shape/size is described. The technique combines projection of demagnified images of simple geometry macroscopic masks with writing. Only a few masks, such as vertical/horizo...