Real-time monitoring of silicon nitride composition during plasma enhanced chemical vapor deposition
The study of bulk and interfacial material properties during thin film deposition or growth is important for learning how to optimize and control processing conditions. Unfortunately, there have been no techniques available that offer simultaneously non-intrusive in situ monitoring, sufficient sensi...
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Published in | Japanese Journal of Applied Physics Vol. 34; no. 4B; pp. 2172 - 2181 |
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Main Authors | , |
Format | Conference Proceeding Journal Article |
Language | English |
Published |
Tokyo
Japanese journal of applied physics
01.04.1995
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Subjects | |
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Abstract | The study of bulk and interfacial material properties during thin film deposition or growth is important for learning how to optimize and control processing conditions. Unfortunately, there have been no techniques available that offer simultaneously non-intrusive
in situ
monitoring, sufficient sensitivity to permit real-time data acquisition, and chemical specificity to determine how process parameters affect composition. In this work, we demonstrate that attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy can be used to provide all these capabilities for the study of plasma enhanced chemical vapor deposition of amorphous, hydrogenated silicon nitride (a-SiN:H). We use this technique to develop a low temperature deposition process where bulk H concentrations are low enough that the material could be useful as a thin film transistor gate dielectric. At the interface between the single crystallne Si substrate and the a-SiN:H layer, we observe a thin layer where the concentration of -Si-H is enriched. The appearance of two distinct absorption bands at 2190 cm
-1
and 2050 cm
-1
suggests that this interfacial layer is formed by amorphisation and hydrogenation of the single crystalline Si substrate. At the interface between the deposited nitride and the reactive plasma, there is an enriched layer of -N-Si-H that appears to act as an intermediate to a-SiN:H growth. |
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AbstractList | The study of bulk and interfacial material properties during thin film deposition or growth is important for learning how to optimize and control processing conditions. Unfortunately, there have been no techniques available that offer simultaneously non-intrusive
in situ
monitoring, sufficient sensitivity to permit real-time data acquisition, and chemical specificity to determine how process parameters affect composition. In this work, we demonstrate that attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy can be used to provide all these capabilities for the study of plasma enhanced chemical vapor deposition of amorphous, hydrogenated silicon nitride (a-SiN:H). We use this technique to develop a low temperature deposition process where bulk H concentrations are low enough that the material could be useful as a thin film transistor gate dielectric. At the interface between the single crystallne Si substrate and the a-SiN:H layer, we observe a thin layer where the concentration of -Si-H is enriched. The appearance of two distinct absorption bands at 2190 cm
-1
and 2050 cm
-1
suggests that this interfacial layer is formed by amorphisation and hydrogenation of the single crystalline Si substrate. At the interface between the deposited nitride and the reactive plasma, there is an enriched layer of -N-Si-H that appears to act as an intermediate to a-SiN:H growth. |
Author | BAILEY, A. D GOTTSCHO, R. A |
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Cites_doi | 10.1016/S0022-3093(05)80234-0 10.1063/1.337314 10.1143/JJAP.24.L861 10.1103/PhysRevB.38.8171 10.1063/1.350603 10.1016/0022-3093(93)90502-O 10.1016/S0022-3093(05)80832-4 10.1016/0040-6090(91)90495-J 10.1063/1.109113 10.1063/1.103168 10.1366/000370278774330685 10.1080/713818456 10.1016/0022-3093(89)90100-2 10.1103/PhysRevB.19.2064 10.1063/1.352828 10.1063/1.110024 10.1116/1.576993 10.1366/0003702824638575 10.1016/0039-6028(86)90890-3 10.1366/000370276774456813 10.1366/0003702814732265 10.1149/1.2221029 10.1103/PhysRevB.41.1664 10.1063/1.109225 10.1103/PhysRevB.45.13367 10.1063/1.103555 10.1557/PROC-284-425 10.1063/1.325095 |
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Keywords | Interfacial layer Plasma Fourier transform spectroscopy Inorganic compounds Process control Binary compounds Amorphous state Solid-solid interfaces Infrared spectra Experimental study CVD Microelectronic fabrication Chemical preparation Hydrogen additions Silicon nitrides Chemical composition Thin film transistor Total reflection PECVD |
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SubjectTerms | Applied sciences Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science; rheology Electronics Exact sciences and technology Lithography, masks and pattern transfer Materials science Methods of deposition of films and coatings; film growth and epitaxy Microelectronic fabrication (materials and surfaces technology) Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
Title | Real-time monitoring of silicon nitride composition during plasma enhanced chemical vapor deposition |
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