Fabrication and Evaluation of Nanometer-Sized Metal Oxide Structures on Composite Metal Thin Films Using Scanning Near-Field Optical Microscope
Nanometer-scale metal-oxide structures with optical transparency have been fabricated on metal films by anodic oxidation using a probe tip of a scanning near-field optical microscope (SNOM). Authors discuss the thickness and the optical transparency of the oxides depending on the bias voltage applie...
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Published in | Japanese Journal of Applied Physics Vol. 41; no. Part 1, No. 10; pp. 6256 - 6263 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
2002
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Abstract | Nanometer-scale metal-oxide structures with optical transparency have been fabricated on metal films by anodic oxidation using a probe tip of a scanning near-field optical microscope (SNOM). Authors discuss the thickness and the optical transparency of the oxides depending on the bias voltage applied to samples for oxidation. For Ti films, the thickness of the oxide increases up to 100 nm linearly with the bias voltage. For composite films consisting of Ti-Al and Ti-Ag layers, the bias-voltage dependence of the oxide thickness is altered at some bias voltages, which concur with those required for the oxidation of the upper Ti layers. Moreover, the oxides have been observed optically by the same SNOM as a transmission mode. The transmittance at the oxide increases with the growth of the oxides, because of the decrease of the thickness of the metal films due to the oxidation. The result also suggests that Ti-, Al- and Ag-oxides fabricated by this method are optically transparent. 48 refs. |
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AbstractList | Nanometer-scale metal-oxide structures with optical transparency have been fabricated on metal films by anodic oxidation using a probe tip of a scanning near-field optical microscope (SNOM). Authors discuss the thickness and the optical transparency of the oxides depending on the bias voltage applied to samples for oxidation. For Ti films, the thickness of the oxide increases up to 100 nm linearly with the bias voltage. For composite films consisting of Ti-Al and Ti-Ag layers, the bias-voltage dependence of the oxide thickness is altered at some bias voltages, which concur with those required for the oxidation of the upper Ti layers. Moreover, the oxides have been observed optically by the same SNOM as a transmission mode. The transmittance at the oxide increases with the growth of the oxides, because of the decrease of the thickness of the metal films due to the oxidation. The result also suggests that Ti-, Al- and Ag-oxides fabricated by this method are optically transparent. 48 refs. |
Author | Watanabe, Yuuichi Tani, Toshirou Tokizaki, Takashi Nishio, Keishi Onuki, Teppei Tsuchiya, Toshio |
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CitedBy_id | crossref_primary_10_1016_j_susc_2004_05_067 crossref_primary_10_1039_b611735j crossref_primary_10_1046_j_1365_2818_2003_01148_x crossref_primary_10_3807_JOSK_2005_9_1_016 crossref_primary_10_3807_JOSK_2005_9_1_001 crossref_primary_10_1016_j_ultramic_2005_06_043 |
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Title | Fabrication and Evaluation of Nanometer-Sized Metal Oxide Structures on Composite Metal Thin Films Using Scanning Near-Field Optical Microscope |
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