Temporary extrusion failures in accelerated lifetime tests of copper interconnects

A novel electromigration failure mode was detected in 0.13-μm technology, copper dual damascene interconnects. Extrusions formed between the test lead and neighboring monitor lines, resulting in short-circuit failure. However, many of these extrusions were short lived, shrinking within a period of a...

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Published inIEEE electron device letters Vol. 26; no. 9; pp. 622 - 624
Main Authors Zhang, Y., Choy, J.H., Chapman, G.H., Kavanagh, K.L.
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.09.2005
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Abstract A novel electromigration failure mode was detected in 0.13-μm technology, copper dual damascene interconnects. Extrusions formed between the test lead and neighboring monitor lines, resulting in short-circuit failure. However, many of these extrusions were short lived, shrinking within a period of a minute to an hour. These phenomena indicated that a temporary "soft failure" existed in accelerated copper electromigration tests in addition to the traditional permanent failure or "hard failure." These soft failures would be missed unless short sampling intervals (less than a minute) and continuous monitoring of the leakage current between test metal lines and neighboring circuits were carried out. Consistent with our experimental results, physical modeling suggested that capillary forces were able to rupture a long and narrow extrusion and the electric field across the extrusion could accelerate this process.
AbstractList A novel electromigration failure mode was detected in 0.13-μm technology, copper dual damascene interconnects. Extrusions formed between the test lead and neighboring monitor lines, resulting in short-circuit failure. However, many of these extrusions were short lived, shrinking within a period of a minute to an hour. These phenomena indicated that a temporary "soft failure" existed in accelerated copper electromigration tests in addition to the traditional permanent failure or "hard failure." These soft failures would be missed unless short sampling intervals (less than a minute) and continuous monitoring of the leakage current between test metal lines and neighboring circuits were carried out. Consistent with our experimental results, physical modeling suggested that capillary forces were able to rupture a long and narrow extrusion and the electric field across the extrusion could accelerate this process.
A novel electromigration failure mode was detected in 0.13-mum technology, copper dual damascene interconnects. Extrusions formed between the test lead and neighboring monitor lines, resulting in short-circuit failure. However, many of these extrusions were short lived, shrinking within a period of a minute to an hour. These phenomena indicated that a temporary "soft failure" existed in accelerated copper electromigration tests in addition to the traditional permanent failure or "hard failure." These soft failures would be missed unless short sampling intervals (less than a minute) and continuous monitoring of the leakage current between test metal lines and neighboring circuits were carried out. Consistent with our experimental results, physical modeling suggested that capillary forces were able to rupture a long and narrow extrusion and the electric field across the extrusion could accelerate this process.
A novel electromigration failure mode was detected in 0.13- mu m technology, copper dual damascene interconnects. Extrusions formed between the test lead and neighboring monitor lines, resulting in short-circuit failure. However, many of these extrusions were short lived, shrinking within a period of a minute to an hour. These phenomena indicated that a temporary "soft failure" existed in accelerated copper electromigration tests in addition to the traditional permanent failure or "hard failure." These soft failures would be missed unless short sampling intervals (less than a minute) and continuous monitoring of the leakage current between test metal lines and neighboring circuits were carried out. Consistent with our experimental results, physical modeling suggested that capillary forces were able to rupture a long and narrow extrusion and the electric field across the extrusion could accelerate this process.
Author Choy, J.H.
Kavanagh, K.L.
Chapman, G.H.
Zhang, Y.
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10.1063/1.368897
10.1109/TR.2002.804737
10.1063/1.1527711
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Issue 9
Keywords soft failure
Modeling
Microelectronic fabrication
Capillary force
Electrodiffusion
Sampling
Chemical mechanical polishing
Electric fault
Metallic bond
Rupture
Durability
electromigration
Failures
Damascene process
temporary extrusion
Accelerated test
Contact line
Short circuit
Electric field
Interconnection
Integrated circuit
Extrusion
Leakage current
Reliability
copper damascene technology
electron wind force
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References ref8
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  publication-title: Proc IEEE 40th Int Reliability Phys Symp
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  year: 2001
  ident: ref4
  article-title: characterization of cu extrusion failure mode in dual-damascene cu/low-k interconnects under electromigration reliability test
  publication-title: Proc 8th IPFA
  contributor:
    fullname: kim
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Snippet A novel electromigration failure mode was detected in 0.13-μm technology, copper dual damascene interconnects. Extrusions formed between the test lead and...
A novel electromigration failure mode was detected in 0.13-mum technology, copper dual damascene interconnects. Extrusions formed between the test lead and...
A novel electromigration failure mode was detected in 0.13- mu m technology, copper dual damascene interconnects. Extrusions formed between the test lead and...
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SubjectTerms Accelerated tests
Acceleration
Applied sciences
Capillary force
Circuit testing
Condition monitoring
Copper
copper damascene technology
Design. Technologies. Operation analysis. Testing
Devices
Electric fields
Electromigration
electron wind force
Electronics
Exact sciences and technology
Extrusion
Extrusions
Failure
Integrated circuit interconnections
Integrated circuits
Leakage current
Life estimation
Lifetime estimation
Microelectronic fabrication (materials and surfaces technology)
Sampling methods
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
soft failure
temporary extrusion
Title Temporary extrusion failures in accelerated lifetime tests of copper interconnects
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