Depth profiling of ultratrace chromium, iron, nickel, and copper in silicon wafers by electrothermal vaporization/ICP-MS - TOMITA, Mitsuhiro; TAKENAKA, Miyuki; MATSUNAGA, Hideki; TSUCHIYA, Norihiko; KUBOTA, Atsuko (BUNSEKI KAGAKU, 1994)
Keywords: chromium; depth profiling; electrothermal vaporization/ICP-MS; iron; nickel; silicon wafer