Triple-band perfect metamaterial absorber with good operating angle polarization tolerance based on split ring arrays
•The proposed absorber achieves triple-band absorption.•The proposed absorber has a good working polarization angle tolerance.•The proposed absorber are beneficial to the fabrication of the device. In this paper, a triple-band perfect metamaterial absorber based on Cu-dielectric-Cu triple-layer nano...
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| Published in | Results in physics Vol. 16; p. 102951 |
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| Main Authors | , , , , , , , , , |
| Format | Journal Article |
| Language | English |
| Published |
Elsevier B.V
01.03.2020
Elsevier |
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| Online Access | Get full text |
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| Abstract | •The proposed absorber achieves triple-band absorption.•The proposed absorber has a good working polarization angle tolerance.•The proposed absorber are beneficial to the fabrication of the device.
In this paper, a triple-band perfect metamaterial absorber based on Cu-dielectric-Cu triple-layer nanostructure is reported. The top metal film structure consists of a ring and four pairs of capacitor plates, which has a frequency selection effect, allowing the absorber to resonate in the near infrared range. Theoretical study shows that the absorption of the three absorption peaks (872.54 nm, 1008.69 nm and 1138.62 nm) are 87.1%, 99.9% and 99.6%, respectively. The average absorption is 95.53%, including two perfect absorption peaks. Changing the structural parameters can affect its absorption peaks and resonant wavelengths. At the same time, due to the high symmetry of the absorber, it is not sensitive to the polarization angle and incident angle. Whether in the TE mode or the TM mode, the absorber at a wide incident angle (0-60°) also exhibits good operating angle polarization tolerance. Therefore, the perfect metamaterial absorber we designed can be widely used in sensing. |
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| AbstractList | In this paper, a triple-band perfect metamaterial absorber based on Cu-dielectric-Cu triple-layer nanostructure is reported. The top metal film structure consists of a ring and four pairs of capacitor plates, which has a frequency selection effect, allowing the absorber to resonate in the near infrared range. Theoretical study shows that the absorption of the three absorption peaks (872.54 nm, 1008.69 nm and 1138.62 nm) are 87.1%, 99.9% and 99.6%, respectively. The average absorption is 95.53%, including two perfect absorption peaks. Changing the structural parameters can affect its absorption peaks and resonant wavelengths. At the same time, due to the high symmetry of the absorber, it is not sensitive to the polarization angle and incident angle. Whether in the TE mode or the TM mode, the absorber at a wide incident angle (0-60°) also exhibits good operating angle polarization tolerance. Therefore, the perfect metamaterial absorber we designed can be widely used in sensing. •The proposed absorber achieves triple-band absorption.•The proposed absorber has a good working polarization angle tolerance.•The proposed absorber are beneficial to the fabrication of the device. In this paper, a triple-band perfect metamaterial absorber based on Cu-dielectric-Cu triple-layer nanostructure is reported. The top metal film structure consists of a ring and four pairs of capacitor plates, which has a frequency selection effect, allowing the absorber to resonate in the near infrared range. Theoretical study shows that the absorption of the three absorption peaks (872.54 nm, 1008.69 nm and 1138.62 nm) are 87.1%, 99.9% and 99.6%, respectively. The average absorption is 95.53%, including two perfect absorption peaks. Changing the structural parameters can affect its absorption peaks and resonant wavelengths. At the same time, due to the high symmetry of the absorber, it is not sensitive to the polarization angle and incident angle. Whether in the TE mode or the TM mode, the absorber at a wide incident angle (0-60°) also exhibits good operating angle polarization tolerance. Therefore, the perfect metamaterial absorber we designed can be widely used in sensing. |
| ArticleNumber | 102951 |
| Author | Wang, Yingying Chen, Xifang Yi, Yougen Tang, Yongjian Yi, Zao Wu, Pinghui Xu, Danyang Chen, Jian Chen, Zeqiang Li, Gongfa |
| Author_xml | – sequence: 1 givenname: Yingying surname: Wang fullname: Wang, Yingying organization: Joint Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Mianyang 621010, China – sequence: 2 givenname: Zeqiang surname: Chen fullname: Chen, Zeqiang organization: Research Center for Photonic Technology, Fujian Key Laboratory for Advanced Micro-nano Photonics Technology and Devices & Key Laboratory of Information Functional Material for Fujian Higher Education, Quanzhou Normal University, Fujian 362000, China – sequence: 3 givenname: Danyang surname: Xu fullname: Xu, Danyang organization: College of Science, Zhejiang University of Technology, Hangzhou 310023, China – sequence: 4 givenname: Zao surname: Yi fullname: Yi, Zao email: yizaomy@swust.edu.cn organization: Joint Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Mianyang 621010, China – sequence: 5 givenname: Xifang surname: Chen fullname: Chen, Xifang email: chenxifang1988@yeah.net organization: Joint Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Mianyang 621010, China – sequence: 6 givenname: Jian surname: Chen fullname: Chen, Jian organization: Joint Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Mianyang 621010, China – sequence: 7 givenname: Yongjian surname: Tang fullname: Tang, Yongjian organization: Joint Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Mianyang 621010, China – sequence: 8 givenname: Pinghui surname: Wu fullname: Wu, Pinghui email: phwu@zju.edu.cn organization: Research Center for Photonic Technology, Fujian Key Laboratory for Advanced Micro-nano Photonics Technology and Devices & Key Laboratory of Information Functional Material for Fujian Higher Education, Quanzhou Normal University, Fujian 362000, China – sequence: 9 givenname: Gongfa surname: Li fullname: Li, Gongfa organization: Key Laboratory of Metallurgical Equipment and Control Technology of Ministry of Education, Wuhan University of Science and Technology, Wuhan 430081, China – sequence: 10 givenname: Yougen surname: Yi fullname: Yi, Yougen organization: College of Physics and Electronics, Central South University, Changsha 410083, China |
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| Keywords | Tunable Triple-band Polarization angle tolerance Perfect metamaterial absorber |
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| Snippet | •The proposed absorber achieves triple-band absorption.•The proposed absorber has a good working polarization angle tolerance.•The proposed absorber are... In this paper, a triple-band perfect metamaterial absorber based on Cu-dielectric-Cu triple-layer nanostructure is reported. The top metal film structure... |
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| SubjectTerms | Perfect metamaterial absorber Polarization angle tolerance Triple-band Tunable |
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| Title | Triple-band perfect metamaterial absorber with good operating angle polarization tolerance based on split ring arrays |
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