Adsorption of atomic hydrogen on the Si(100)-(2x1)-Sb surface

• Published in: Japanese Journal of Applied Physics Vol. 36; no. 7A; pp. 4435 - 4439
• Main Authors: RYU, J.-T, KUI, K, NODA, K, KATAYAMA, M, OURA, K
• Format: Journal Article
• Language: English
• Published: Tokyo Japanese journal of applied physics 01.07.1997
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Physics; Solid surfaces and solid-solid interfaces; Surface structure and topography; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Inorganic adsorbate; Semiconductor materials; Antimony; Desorption; Inorganic adsorbent; Experimental study; Surface structure; Nonmetals; Ion scattering; Hydrogen Atoms; Adsorption structure; Silicon; LEED
• DOI: 10.1143/jjap.36.4435
• ISSN: 0021-4922

The structural change of a Si(100)-(2×1)-Sb surface caused by atomic hydrogen adsorption at room temperature and 100°C was studied using time-of-flight impact collision ion scattering spectroscopy (TOF-ICISS) and low energy electron diffraction (LEED). In this study, we found from the change of TOF-spectra and α-scans that when atomic hydrogen adsorbs on the Si(100)-(2×1)-Sb surface, (1) a structural transformation from (2×1) to (1×1) occurs, (2) Sb atoms existing on the Si(100) surface partly desorb even at room temperature, and (3) the rest of the Sb atoms are displaced from their original positions and form an almost two-dimensional layer with dispersive distribution of Sb atoms. These results are different from those for other metal adsorbates/Si systems reported previously.