The key role in the structure and properties of a novel CrNiTiMo high-entropy alloys films prepared by magnetron sputtering: Bias voltage

In this study, CrNiTiMo high-entropy alloys films were prepared on 304 stainless steel and silicon wafer substrates by direct current magnetron sputtering and the effects of bias voltages (0 to −200 V) on microstructure, chemical composition, hardness and corrosion resistance were investigated. The...

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Bibliographic Details
Published inJournal of materials research and technology Vol. 32; pp. 1820 - 1831
Main Authors Zhao, Kai, Hao, Xuehui, Ma, Dandan, Huang, Baoxu, Zhao, Xingchuan, Ma, Jie, Wang, Changzheng
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.09.2024
Elsevier
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