The key role in the structure and properties of a novel CrNiTiMo high-entropy alloys films prepared by magnetron sputtering: Bias voltage
In this study, CrNiTiMo high-entropy alloys films were prepared on 304 stainless steel and silicon wafer substrates by direct current magnetron sputtering and the effects of bias voltages (0 to −200 V) on microstructure, chemical composition, hardness and corrosion resistance were investigated. The...
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Published in | Journal of materials research and technology Vol. 32; pp. 1820 - 1831 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
01.09.2024
Elsevier |
Subjects | |
Online Access | Get full text |
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