APA (7th ed.) Citation

Zhao, K., Hao, X., Ma, D., Huang, B., Zhao, X., Ma, J., & Wang, C. (2024). The key role in the structure and properties of a novel CrNiTiMo high-entropy alloys films prepared by magnetron sputtering: Bias voltage. Journal of materials research and technology, 32, 1820-1831. https://doi.org/10.1016/j.jmrt.2024.08.024

Chicago Style (17th ed.) Citation

Zhao, Kai, Xuehui Hao, Dandan Ma, Baoxu Huang, Xingchuan Zhao, Jie Ma, and Changzheng Wang. "The Key Role in the Structure and Properties of a Novel CrNiTiMo High-entropy Alloys Films Prepared by Magnetron Sputtering: Bias Voltage." Journal of Materials Research and Technology 32 (2024): 1820-1831. https://doi.org/10.1016/j.jmrt.2024.08.024.

MLA (9th ed.) Citation

Zhao, Kai, et al. "The Key Role in the Structure and Properties of a Novel CrNiTiMo High-entropy Alloys Films Prepared by Magnetron Sputtering: Bias Voltage." Journal of Materials Research and Technology, vol. 32, 2024, pp. 1820-1831, https://doi.org/10.1016/j.jmrt.2024.08.024.