RE (La, Nd and Yb) doped CeO2 abrasive particles for chemical mechanical polishing of dielectric materials: Experimental and computational analysis

• Published in: Applied surface science Vol. 506; p. 144668
• Main Authors: Cheng, Jie, Huang, Shuo, Li, Yang, Wang, Tongqing, Xie, Lile, Lu, Xinchun
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 15.03.2020
• Subjects: Ceria (CeO2); Chemical mechanical polishing (CMP); Density functional theory (DFT); Incipient impregnation; Lanthanide elements; Surface doping; Incipient impregnation; Chemical mechanical polishing (CMP); Lanthanide elements; Surface doping; Ceria (CeO2); Density functional theory (DFT)

•Surface doping of CeO2 as CMP abrasives was done using La, Nd and Yb.•O vacancy formation energy and Ce3+ content was calculated by DFT and XPS.•Ce3+ content of CeO2 is largely improved after doping.•Doped CeO2 as CMP abrasive improves the polishing rate of SiO2 and surface quality. Ce3+ in CeO2, r...