Direct growth of graphene on gallium nitride using C2H2 as carbon source

Growing graphene on gallium nitride (GaN) at temperatures greater than 900℃ is a challenge that must be overcome to obtain high quality of GaN epi-layers. We successfully met this challenge using C2H2 as the carbon source. We demonstrated that graphene can be grown both on copper and directly on GaN...

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Published inFrontiers of physics Vol. 11; no. 2; pp. 97 - 102
Main Author 王兵 赵云 伊晓燕 王国宏 刘志强 段瑞飞 黄鹏 王军喜 李晋闽
Format Journal Article
LanguageEnglish
Published Beijing Higher Education Press 01.04.2016
Springer Nature B.V
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Summary:Growing graphene on gallium nitride (GaN) at temperatures greater than 900℃ is a challenge that must be overcome to obtain high quality of GaN epi-layers. We successfully met this challenge using C2H2 as the carbon source. We demonstrated that graphene can be grown both on copper and directly on GaN epi-layers. The Raman spectra indicated that the graphene films were about 4-5 layers thick. Meanwhile, the effects of the growth temperature on the growth of the graphene films were systematically studied, and 830℃ was found to be the optimum growth temperature. We successfully grew high-quality graphene films directly on gallium nitride.
Bibliography:graphene, C2H2, gallium nitride, chemical vapor deposition, Raman spectroscopy
Growing graphene on gallium nitride (GaN) at temperatures greater than 900℃ is a challenge that must be overcome to obtain high quality of GaN epi-layers. We successfully met this challenge using C2H2 as the carbon source. We demonstrated that graphene can be grown both on copper and directly on GaN epi-layers. The Raman spectra indicated that the graphene films were about 4-5 layers thick. Meanwhile, the effects of the growth temperature on the growth of the graphene films were systematically studied, and 830℃ was found to be the optimum growth temperature. We successfully grew high-quality graphene films directly on gallium nitride.
Bing Wang , Vun Zhao , Xiao-Yan Yi , Guo-Hong Wang ,Zhi-Qiang Liu , Rui-Rei Duan , Peng Huang , Jun-Xi Wang , Jin-Min Li ( Semiconductor Lighting Technology R&D Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China)
11-5994/O4
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 14
ISSN:2095-0462
2095-0470
DOI:10.1007/s11467-015-0534-5