Direct growth of graphene on gallium nitride using C2H2 as carbon source
Growing graphene on gallium nitride (GaN) at temperatures greater than 900℃ is a challenge that must be overcome to obtain high quality of GaN epi-layers. We successfully met this challenge using C2H2 as the carbon source. We demonstrated that graphene can be grown both on copper and directly on GaN...
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Published in | Frontiers of physics Vol. 11; no. 2; pp. 97 - 102 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
Beijing
Higher Education Press
01.04.2016
Springer Nature B.V |
Subjects | |
Online Access | Get full text |
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Summary: | Growing graphene on gallium nitride (GaN) at temperatures greater than 900℃ is a challenge that must be overcome to obtain high quality of GaN epi-layers. We successfully met this challenge using C2H2 as the carbon source. We demonstrated that graphene can be grown both on copper and directly on GaN epi-layers. The Raman spectra indicated that the graphene films were about 4-5 layers thick. Meanwhile, the effects of the growth temperature on the growth of the graphene films were systematically studied, and 830℃ was found to be the optimum growth temperature. We successfully grew high-quality graphene films directly on gallium nitride. |
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Bibliography: | graphene, C2H2, gallium nitride, chemical vapor deposition, Raman spectroscopy Growing graphene on gallium nitride (GaN) at temperatures greater than 900℃ is a challenge that must be overcome to obtain high quality of GaN epi-layers. We successfully met this challenge using C2H2 as the carbon source. We demonstrated that graphene can be grown both on copper and directly on GaN epi-layers. The Raman spectra indicated that the graphene films were about 4-5 layers thick. Meanwhile, the effects of the growth temperature on the growth of the graphene films were systematically studied, and 830℃ was found to be the optimum growth temperature. We successfully grew high-quality graphene films directly on gallium nitride. Bing Wang , Vun Zhao , Xiao-Yan Yi , Guo-Hong Wang ,Zhi-Qiang Liu , Rui-Rei Duan , Peng Huang , Jun-Xi Wang , Jin-Min Li ( Semiconductor Lighting Technology R&D Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China) 11-5994/O4 ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 |
ISSN: | 2095-0462 2095-0470 |
DOI: | 10.1007/s11467-015-0534-5 |